SCHEMBL6697933

SCHEMBL6697933

C=C(C)c1ccc(OC(OC2CCCC2)C(C)(C)C)cc1

nearest known ligand 0.35

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 3/20 0.35
NPC1 O15118 2/20 0.35
RAB9A P51151 2/20 0.35
HPGD P15428 1/20 0.35
NPSR1 Q6W5P4 1/20 0.33
PARP10 Q53GL7 1/20 0.31
LMNA P02545 1/20 0.31
MAPT P10636 1/20 0.31
HTT P42858 2/20 0.31
ALDH1A1 P00352 2/20 0.30
TSHR P16473 1/20 0.30
MDM2 Q00987 1/20 0.30
KDM4E B2RXH2 1/20 0.30
STS P08842 1/20 0.30
FURIN P09958 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6693701 0.99 RAB9A (0.36) SMN1; SMN2NPC1RAB9AHPGDNPSR1
SCHEMBL6699705 0.82 SMN1; SMN2 (0.38) SMN1; SMN2NPC1RAB9AHPGDNPSR1
SCHEMBL6694449 0.81 SMN1; SMN2 (0.40) SMN1; SMN2NPC1RAB9AHPGDNPSR1
SCHEMBL6689734 0.81 SMN1; SMN2 (0.40) SMN1; SMN2NPC1RAB9AHPGDNPSR1
SCHEMBL686104 0.80 RAB9A (0.42) SMN1; SMN2NPC1RAB9AHPGDNPSR1
SCHEMBL6697869 0.79 HPGD (0.32) HPGDALDH1A1KDM4E
SCHEMBL6694197 0.78 HPGD (0.34) HPGDMAPTALDH1A1KDM4E
SCHEMBL6693617 0.78 SMN1; SMN2 (0.35) SMN1; SMN2NPC1RAB9AHPGDNPSR1
SCHEMBL6697835 0.77 MAPT (0.36) PARP10MAPTALDH1A1
SCHEMBL6691344 0.77 SMN1; SMN2 (0.36) SMN1; SMN2NPC1RAB9AHPGDNPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed