⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL9540508 | 0.96 | — | — | |
| SCHEMBL8768560 | 0.82 | — | — | |
| SCHEMBL321976 | 0.82 | — | — | |
| SCHEMBL146182 | 0.80 | TDP1 (0.42) | — | |
| SCHEMBL765962 | 0.79 | — | — | |
| SCHEMBL20678765 | 0.79 | — | — | |
| SCHEMBL18808043 | 0.79 | FDPS (0.32) | — | |
| SCHEMBL121257 | 0.78 | — | — | |
| SCHEMBL338023 | 0.78 | — | — | |
| SCHEMBL9491344 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 301 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024056526-A1 | SIZING AGENT COMPRISING FUNCTIONALIZED POLYOLEFINS | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2024-03-21 | — | — | WO | claimed |
| US-20230381732-A1 | NANOPARTICLE TEMPLATES AND METHODS OF USE FOR MAKING HOLLOW NANOPARTICLES | THE BOARD OF REGENTS OF THE UNIVERSITY OF OKLAHOMA | 2023-11-30 | — | — | US | claimed |
| EP-1721030-B1 | METHOD OF ANODIZING METALLIC SURFACES | CHEMETALL GMBH (DE) | 2017-05-10 | — | — | EP | claimed |
| US-8945366-B2 | Method of anodizing metallic surfaces and compositions therefore | CHEMETALL GMBH (DE) | 2015-02-03 | — | — | US | claimed |
| CN-103462824-A | Hairspray | GUANGDONG BAIYA COSMETICS CO LTD | 2013-12-25 | — | — | CN | claimed |
| CN-1997777-B | Method of anodizing metallic surfaces and compositions | CHEMETALL GMBH | 2012-08-22 | — | — | CN | claimed |
| WO-2010104705-A1 | INHIBITORS OF AKT ACTIVITY | MERCK SHARP & DOHME CORP. (US) | 2010-09-16 | — | — | WO | claimed |
| US-20100230289-A1 | Method of anodizing metallic surfaces and compositions therefore | OSTROVSKY IIYA | 2010-09-16 | — | — | US | claimed |
| CN-1997777-A | Method of anodizing metallic surfaces and compositions | CHEMETALL GMBH (DE) | 2007-07-11 | — | — | CN | claimed |
| EP-1721030-A1 | METHOD OF ANODIZING METALLIC SURFACES AND COMPOSITIONS THEREFOR | Chemetall GmbH (DE) | 2006-11-15 | — | — | EP | claimed |
| EP-1392228-A1 | HAIR DYE COMPOSITION | Combe International, Ltd. (US) | 2004-03-03 | — | — | EP | claimed |
| WO-2002056850-A1 | HAIR DYE COMPOSITION | COMBE INTERNATIONAL, INC. (US) | 2002-07-25 | — | — | WO | claimed |
| US-6200736-B1 | A MULTI-CYCLE DEVELOPMENT PROCESS FOR ELECTRON-BEAM EXPOSED NOVOLAK-RESIN BASED PHOTORESISTS WITH RESOLUTION OF LESS THAN 0.20 .MU.M(MICRONS), HIGH CONTRAST, AND REDUCES DARK LOSS, AND IMPROVES SCUM REMOVAL | ETEC SYSTEMS, INC. | 2001-03-13 | — | — | US | claimed |
| US-6107009-A | FOR DEVELOPING ELECTRON BEAM EXPOSED POSITIVE PHOTORESISTS | APPLIED MATERIALS, INC. | 2000-08-22 | — | — | US | claimed |
| EP-0991983-A1 | PHOTORESIST DEVELOPER AND METHOD OF DEVELOPMENT | Etec Systems, Inc. (US) | 2000-04-12 | — | — | EP | claimed |
| WO-1999053381-A1 | PHOTORESIST DEVELOPER AND METHOD OF DEVELOPMENT | ETEC SYSTEMS, INC. (US) | 1999-10-21 | — | — | WO | claimed |
| EP-0072138-B1 | AGENT AND METHOD FOR MODIFYING SURFACE LAYER OF CEMENT STRUCTURES | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1985-10-09 | — | — | EP | claimed |
| US-4521249-A | WITH SODIUM NAPHTHALENESULFONATE-FORMALDEHYDE CONDENSATE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 1985-06-04 | — | — | US | claimed |
| US-4443496-A | Agent and method for modifying surface layer of cement structures | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 1984-04-17 | — | — | US | claimed |
| EP-0072138-A2 | Agent and method for modifying surface layer of cement structures | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1983-02-16 | — | — | EP | claimed |