SCHEMBL6695290

SCHEMBL6695290

C=C(C)c1ccc(OC(CCC)OC)cc1

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TAS1R3 Q7RTX0 2/20 0.38
TAS1R1 Q7RTX1 2/20 0.38
MAPT P10636 2/20 0.34
SLC6A2 P23975 1/20 0.34
SLC6A4 P31645 1/20 0.34
SLC6A3 Q01959 1/20 0.34
NR1I2 O75469 1/20 0.33
LTB4R Q15722 1/20 0.32
LTB4R2 Q9NPC1 1/20 0.32
KMT2A Q03164 2/20 0.32
PPARG P37231 3/20 0.31
PPARA Q07869 3/20 0.31
MEN1 O00255 1/20 0.31
PARP10 Q53GL7 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
PKM P14618 1/20 0.31
LMNA P02545 1/20 0.30
POLB P06746 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6694117 0.91 TAS1R3 (0.33) TAS1R3TAS1R1MAPTNR1I2
SCHEMBL6691138 0.88 MAPT (0.37) MAPTNR1I2KMT2APPARGPPARA
SCHEMBL6689712 0.86 TAS1R3 (0.36) TAS1R3TAS1R1MAPTSLC6A2SLC6A4
SCHEMBL6694156 0.84 TAS1R3 (0.33) TAS1R3TAS1R1MAPTSLC6A2SLC6A4
SCHEMBL6694609 0.84 KMT2A (0.37) TAS1R3TAS1R1MAPTSLC6A2SLC6A4
SCHEMBL6693689 0.84 GAA (0.36) TAS1R3TAS1R1MAPTLMNA
SCHEMBL6694138 0.83 TAS1R3 (0.33) TAS1R3TAS1R1LTB4RLTB4R2
SCHEMBL6693755 0.82 TP53 (0.40) MAPTLMNA
SCHEMBL6689548 0.81 TP53 (0.42) MAPTLMNA
SCHEMBL6694774 0.79 SMN1; SMN2 (0.33) TAS1R3TAS1R1MAPTSLC6A2SLC6A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed