SCHEMBL6689712

SCHEMBL6689712

C=C(C)c1ccc(OC(CCC)OCC)cc1

nearest known ligand 0.36

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TAS1R3 Q7RTX0 2/20 0.36
TAS1R1 Q7RTX1 2/20 0.36
LTB4R Q15722 1/20 0.32
LTB4R2 Q9NPC1 1/20 0.32
KMT2A Q03164 1/20 0.31
SLC6A2 P23975 1/20 0.31
SLC6A4 P31645 1/20 0.31
SLC6A3 Q01959 1/20 0.31
PPARG P37231 3/20 0.31
PPARA Q07869 3/20 0.31
PARP10 Q53GL7 2/20 0.30
MAPT P10636 1/20 0.30
PRSS1 P07477 1/20 0.30
PRSS2 P07478 1/20 0.30
PRSS3 P35030 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6689384 0.91 TAS1R3 (0.32) TAS1R3TAS1R1
SCHEMBL6694156 0.89 TAS1R3 (0.33) TAS1R3TAS1R1LTB4RLTB4R2KMT2A
SCHEMBL6693689 0.89 GAA (0.36) TAS1R3TAS1R1MAPT
SCHEMBL685869 0.87 KMT2A (0.33) KMT2APPARGPPARAPARP10MAPT
SCHEMBL6693755 0.87 TP53 (0.40) MAPT
SCHEMBL6695290 0.86 TAS1R3 (0.38) TAS1R3TAS1R1LTB4RLTB4R2KMT2A
SCHEMBL6689548 0.85 TP53 (0.42) MAPT
SCHEMBL6694609 0.83 KMT2A (0.37) TAS1R3TAS1R1LTB4RLTB4R2KMT2A
SCHEMBL6693603 0.83 GAA (0.36) MAPT
SCHEMBL6694138 0.82 TAS1R3 (0.33) TAS1R3TAS1R1LTB4RLTB4R2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed