SCHEMBL6698046

SCHEMBL6698046

CCCCC(C)(O)C(=O)c1ccccc1

nearest known ligand 0.47

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CES1 P23141 7/20 0.47
CES2 O00748 5/20 0.47
NAAA Q02083 1/20 0.44
SRC P12931 1/20 0.43
GAA P10253 1/20 0.42
LMNA P02545 1/20 0.41
PTGS2 P35354 1/20 0.41
KMT2A Q03164 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
PRSS1 P07477 1/20 0.40
CTSG P08311 1/20 0.40
CTRB1 P17538 1/20 0.40
CMA1 P23946 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6692680 0.95 CES1 (0.49) CES1CES2NAAASRCGAA
SCHEMBL10949387 0.94 ALDH1A1 (0.49) CES1CES2LMNA
SCHEMBL27626658 0.93 CES2 (0.50) CES1CES2NAAAGAAPRSS1
SCHEMBL27868597 0.93 CES2 (0.50) CES1CES2NAAAGAAPRSS1
SCHEMBL9617688 0.89 SRC (0.46) CES1CES2NAAASRCGAA
SCHEMBL10946918 0.88 ALDH1A1 (0.47) CES1CES2NAAAGAALMNA
SCHEMBL11292363 0.87 CES1 (0.50) CES1CES2SRCKMT2ATDP1
SCHEMBL29064653 0.86 CES1 (0.43) CES1CES2SRCLMNAKMT2A
SCHEMBL6932937 0.84 GAA (0.50) CES1CES2NAAASRCGAA
SCHEMBL5321540 0.84 CES1 (0.49) CES1CES2NAAASRCLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4996132-A Heat-resistant photosensitive resin composition TOYKO OHKA KOGYO CO. LTD. (JP) 1991-02-26 US claimed
EP-0280295-A2 A heat-resistant photosensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 1988-08-31 EP claimed
CN-1269849-C Polymerization process CIBA SPEC CHEM WATER TREAT LTD (GB) 2006-08-16 CN disclosed
CN-1492880-A Polymerization process 西巴特殊化学水处理有限公司 2004-04-28 CN disclosed
US-20040077744-A1 Irradiation polymerization of acrylamide and/or monomer blends in the presence of photoinintiators, to form water soluble polymers used as flocculants, flow control agents, coagulants, dispersants, superabsorbents or binders CIBA SPECIALTY CHEMICALS WATER TREATMENTS LIMITED (GB) 2004-04-22 US disclosed
EP-1368382-A1 POLYMERISATION PROCESS Ciba Specialty Chemicals Water Treatments Limited (GB) 2003-12-10 EP disclosed
WO-2002066520-A1 POLYMERISATION PROCESS CIBA SPECIALTY CHEMICALS WATER TREATMENTS LIMITED (GB) 2002-08-29 WO disclosed
US-4547394-A PHOTOINITIATORS FOR PHOTOPOLYMERIZATION MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 1985-10-15 US disclosed
US-4321118-A Bis benzoyl sensitizers for photopolymerization or photo cross linking process and composition CIBA-GEIGY CORPORATION (US) 1982-03-23 US disclosed
US-4318791-A PHOTOPOLYMERIZABLE SYSTEM FOR INKS CIBA-GEIGY CORPORATION (US) 1982-03-09 US disclosed
US-4315807-A Sensitizers for photopolymerization CIBA-GEIGY CORPORATION (US) 1982-02-16 US disclosed
US-4308400-A AROMATIC HYDROXY KETONES CIBA-GEIGY A.G. (CH) 1981-12-29 US disclosed
EP-0003002-A2 Use of aromatic-aliphatic ketones as photoinitiators, photopolymerisable systems containing such ketones and aromatic-aliphatic ketones CIBA-GEIGY AG (CH) 1979-07-11 EP disclosed