SCHEMBL6699196

SCHEMBL6699196

CC[Si](CCN)(OC(C)=O)OC(C)=O

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
PAOX Q6QHF9 2/20 0.33
ALDH1A1 P00352 1/20 0.32
LMNA P02545 1/20 0.32
HSD17B10 Q99714 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15643185 0.89 PAOX (0.41) PAOXALDH1A1LMNAHSD17B10
SCHEMBL705906 0.86 ALDH1A1 (0.38) ALDH1A1LMNAHSD17B10
SCHEMBL701705 0.82 ALDH1A1 (0.35) PAOXALDH1A1LMNAHSD17B10
SCHEMBL707751 0.82 ALDH1A1 (0.35) PAOXALDH1A1LMNAHSD17B10
SCHEMBL27710247 0.82 ALDH1A1 (0.35) ALDH1A1LMNAHSD17B10
SCHEMBL27658713 0.82 ALDH1A1 (0.35) PAOXALDH1A1LMNAHSD17B10
SCHEMBL133195 0.81 ALDH1A1 (0.41) ALDH1A1LMNAHSD17B10
SCHEMBL27722851 0.80 ALDH1A1 (0.33) ALDH1A1LMNAHSD17B10
SCHEMBL27710209 0.78 ALDH1A1 (0.32) ALDH1A1LMNAHSD17B10
SCHEMBL13089470 0.77 ALDH1A1 (0.31) ALDH1A1LMNAHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101646718-B Curable resin composition, protective film, and method for forming protective film JSR CORP JP 2013-04-03 CN disclosed
CN-101646718-A The formation method of curable resin composition, protective membrane and protective membrane JSR CORP JP 2010-02-10 CN disclosed
CN-101324755-A Radiation sensitive resin composition, interlayer dielectric and microlens, and method for producing thereof JSR CORP (JP) 2008-12-17 CN disclosed
CN-101226329-A Radiation sensitive resin composition, laminated insulating film, micro lens and preparation method thereof JSR CORP (JP) 2008-07-23 CN disclosed
US-20040197484-A1 Coating liquid for forming insulating film and method for producing insulating film SUMITOMO CHEMICAL COMPANY, LIMITED 2004-10-07 US disclosed