SCHEMBL6701464

SCHEMBL6701464

SCc1ccccc1-c1ccccc1-c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DPP4 P27487 1/20 0.50
FOLH1 Q04609 2/20 0.44
PDCD1 Q15116 1/20 0.44
CD274 Q9NZQ7 1/20 0.44
IDO1 P14902 2/20 0.43
KMT2A Q03164 1/20 0.42
ALDH1A1 P00352 3/20 0.39
HSD17B10 Q99714 2/20 0.39
HPGD P15428 1/20 0.39
BCL2L1 Q07817 1/20 0.39
CYP2A6 P11509 1/20 0.39
MAPK1 P28482 1/20 0.39
DCLRE1A Q6PJP8 1/20 0.39
DCLRE1B Q9H816 1/20 0.39
HTR7 P34969 1/20 0.37
CYP11B1 P15538 1/20 0.37
CYP11B2 P19099 1/20 0.37
CA12 O43570 1/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2209528 0.91 DPP4 (0.60) DPP4FOLH1PDCD1CD274IDO1
SCHEMBL7204768 0.79 PDCD1 (0.61) DPP4FOLH1PDCD1CD274KMT2A
SCHEMBL6701461 0.78 DPP4 (0.47) DPP4FOLH1PDCD1CD274IDO1
SCHEMBL28655366 0.78 DPP4 (0.47) DPP4FOLH1PDCD1CD274IDO1
SCHEMBL27900782 0.78 FOLH1 (0.50) DPP4FOLH1PDCD1CD274IDO1
SCHEMBL31753971 0.77 DPP4 (0.50) DPP4FOLH1PDCD1CD274KMT2A
SCHEMBL31124517 0.77 DPP4 (0.50) DPP4FOLH1PDCD1CD274KMT2A
SCHEMBL1727355 0.77 DPP4 (0.50) DPP4FOLH1PDCD1CD274KMT2A
SCHEMBL29265422 0.77 DPP4 (0.50) DPP4FOLH1PDCD1CD274KMT2A
SCHEMBL29800393 0.77 DPP4 (0.50) DPP4FOLH1PDCD1CD274KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-2004033824-A ULTRAVIOLET-RESISTANT SELF-ORGANIZED MONOMOLECULAR FILM MADE OF MULTIPLE AROMATIC RING COMPOUND NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 2004-02-05 JP disclosed