SCHEMBL6704236

SCHEMBL6704236

[CH2]SC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.43
POLB P06746 1/20 0.43
THRB P10828 1/20 0.43
BLM P54132 1/20 0.43
PMP22 Q01453 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
GRIN2D O15399 5/20 0.38
GRIN3B O60391 5/20 0.38
GRIN1 Q05586 5/20 0.38
GRIN2A Q12879 5/20 0.38
GRIN2B Q13224 5/20 0.38
GRIN2C Q14957 5/20 0.38
GRIN3A Q8TCU5 5/20 0.38
SLC22A2 O15244 2/20 0.38
SLC47A1 Q96FL8 2/20 0.38
SLC22A1 O15245 1/20 0.38
TSHR P16473 1/20 0.38
NFKB1 P19838 1/20 0.38
STAT6 P42226 1/20 0.38
SIGMAR1 Q99720 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3915588 0.73 LMNA (0.47) LMNAPOLBTHRBBLMPMP22
SCHEMBL28608224 0.73 LMNA (0.47) LMNAPOLBTHRBBLMPMP22
SCHEMBL11306719 0.69 LMNA (0.50) LMNAPOLBTHRBBLMPMP22
SCHEMBL6704238 0.69 LMNA (0.43) LMNAPOLBTHRBBLMPMP22
SCHEMBL10012001 0.69 LMNA (0.43) LMNAPOLBTHRBBLMPMP22
SCHEMBL16311149 0.69 LMNA (0.43) LMNAPOLBTHRBBLMPMP22
SCHEMBL31718014 0.69 LMNA (0.43) LMNAPOLBTHRBBLMPMP22
Hydrochloric Acid SCHEMBL27725580 0.67 LMNA (0.47) LMNAPOLBTHRBBLMPMP22
SCHEMBL29738642 0.67 ALDH1A1 (0.45) LMNAPOLBTHRBBLMPMP22
SCHEMBL19514675 0.67 LMNA (0.41) LMNAPOLBTHRBBLMPMP22

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8575249-B2 High heat-resistant polygermane compound with sulfur-containing organic group NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2013-11-05 US disclosed
US-20130059951-A1 HIGH HEAT-RESISTANT POLYGERMANE COMPOUND WITH SULFUR-CONTAINING ORGANIC GROUP TOHOKU UNIVERSITY (JP) 2013-03-07 US disclosed
EP-2537852-A1 POLYGERMANE COMPOUND WITH SULPHUR-CONTAINING ORGANIC GROUP DISPLAYING HIGH HEAT RESISTANCE Nissan Chemical Industries, Ltd. (JP) 2012-12-26 EP disclosed
EP-0987567-B1 A sulfur-containing (thio)ether (co)polymer and a use thereof MITSUI CHEMICALS INC (JP) 2004-04-07 EP disclosed
CN-1117991-C (Co) polymer containing sulphur, (thio-) ether and its use MITSUI CHEMICALS INC (JP) 2003-08-13 CN disclosed
US-6320020-B1 POLYMER OR COPOLYMER CONTAINING A SULFUR ATOM WHOSE PRINCIPAL BACKBONE COMPRISES ETHER AND/OR THIOETHER BONDS; OPTICAL DISK SUBSTRATE; A LIQUID-CRYSTAL PLASTIC SUBSTRATE; VARIOUS OPTICAL LENSES INCLUDING AN EYEGLASS; AND AN LED SEALING COAT. MITSUI CHEMICALS, INC. (JP) 2001-11-20 US disclosed
CN-1250060-A (Co) polymer containing sulphur, (thio-) ether and its use MITSUI CHEMICALS INC (JP) 2000-04-12 CN disclosed
EP-0987567-A1 A sulfur-containing (thio)ether (co)polymer and a use thereof Mitsui Chemicals, Inc. (JP) 2000-03-22 EP disclosed