Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.57 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.51 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.51 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.51 |
| ▸ | GAA | P10253 | 1/20 | 0.51 |
| ▸ | PKM | P14618 | 1/20 | 0.51 |
| ▸ | GFER | P55789 | 1/20 | 0.51 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.47 |
| ▸ | NQO2 | P16083 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 3/20 | 0.46 |
| ▸ | HPGD | P15428 | 2/20 | 0.46 |
| ▸ | TSHR | P16473 | 2/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.46 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.46 |
| ▸ | APEX1 | P27695 | 1/20 | 0.46 |
| ▸ | BLM | P54132 | 1/20 | 0.46 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10172227 | 1.00 | SMN1; SMN2 (0.57) | SMN1; SMN2ALDH1A1NPSR1MAPK1HSP90AA1 | |
| SCHEMBL6706162 | 1.00 | SMN1; SMN2 (0.57) | SMN1; SMN2ALDH1A1NPSR1MAPK1HSP90AA1 | |
| SCHEMBL12994619 | 0.85 | NPSR1 (0.47) | SMN1; SMN2ALDH1A1NPSR1MAPK1HSP90AA1 | |
| SCHEMBL10233427 | 0.85 | NPSR1 (0.47) | SMN1; SMN2ALDH1A1NPSR1MAPK1HSP90AA1 | |
| SCHEMBL23504933 | 0.83 | NPSR1 (0.50) | SMN1; SMN2ALDH1A1NPSR1MAPK1HSP90AA1 | |
| SCHEMBL1344768 | 0.83 | NPSR1 (0.50) | SMN1; SMN2ALDH1A1NPSR1MAPK1HSP90AA1 | |
| SCHEMBL12454187 | 0.83 | NPSR1 (0.46) | SMN1; SMN2ALDH1A1NPSR1MAPK1HSP90AA1 | |
| SCHEMBL1344772 | 0.83 | NPSR1 (0.50) | SMN1; SMN2ALDH1A1NPSR1MAPK1HSP90AA1 | |
| SCHEMBL10859395 | 0.81 | SMN1; SMN2 (0.57) | SMN1; SMN2ALDH1A1NPSR1MAPK1KDM4E | |
| SCHEMBL10859399 | 0.81 | SMN1; SMN2 (0.57) | SMN1; SMN2ALDH1A1NPSR1MAPK1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6770420-B2 | Alkylsulfonyloximes for high-resolution i-line photoresists of high sensitivity | CIBA SPECIALTY CHEMICALS CORPORATION | 2004-08-03 | — | — | US | disclosed |
| US-20040013974-A1 | Alkylsulfonyloximes for high-resolution i-line photoresists of high sensitivity | DIETLIKER KURT (CH) | 2004-01-22 | — | — | US | disclosed |
| EP-0925529-B1 | ALKYSULFONYLOXIMES FOR HIGH-RESOLUTION I-LINE PHOTORESISTS OF HIGH SENSITIVITY | CIBA SC HOLDING AG (CH) | 2003-04-16 | — | — | EP | disclosed |
| EP-0780729-B1 | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2002-07-10 | — | — | EP | disclosed |
| EP-0821274-B1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2001-11-14 | — | — | EP | disclosed |
| US-6245930-B1 | AN OXIMESULFONATE COMPOUND CAPABLE OF GIVING POSITIVELY OR NEGATIVELY PATTERNED RESIST LAYER OF EXCELLENT PATTERN RESOLUTION, CROSS SECTIOANL PROFILE, AND HIGH SENSITIVITY | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-06-12 | — | — | US | disclosed |
| US-6183934-B1 | FOE USE IN FORMATION OF PATTERN OF INSULATION FILM, PASSIVATION FILM, .ALPHA.-RAY SHIELDING FILM, OPTICAL WAVEGUIDE | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-02-06 | — | — | US | disclosed |
| US-6063953-A | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-05-16 | — | — | US | disclosed |
| US-6022666-A | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-02-08 | — | — | US | disclosed |
| US-5976760-A | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-11-02 | — | — | US | disclosed |
| EP-0925529-A1 | ALKYSULFONYLOXIMES FOR HIGH-RESOLUTION I-LINE PHOTORESISTS OF HIGH SENSITIVITY | Ciba SC Holding AG (CH) | 1999-06-30 | — | — | EP | disclosed |
| US-5902713-A | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-05-11 | — | — | US | disclosed |
| EP-0571330-B1 | High-resolution photoresist with enhanced sensitivity for I-line exposure | CIBA GEIGY AG (CH) | 1999-04-07 | — | — | EP | disclosed |
| US-5759740-A | High resolution i-line photoresist of high sensitivity | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 1998-06-02 | — | — | US | disclosed |
| WO-1998010335-A1 | ALKYSULFONYLOXIMES FOR HIGH-RESOLUTION I-LINE PHOTORESISTS OF HIGH SENSITIVITY | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 1998-03-12 | — | — | WO | disclosed |
| EP-0821274-A1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-01-28 | — | — | EP | disclosed |
| EP-0780729-A1 | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-06-25 | — | — | EP | disclosed |
| US-5627011-A | High resolution i-line photoresist of high sensitivity | CIBA-GEIGY CORPORATION (US) | 1997-05-06 | — | — | US | disclosed |
| EP-0571330-A1 | High-resolution photoresist with enhanced sensitivity for I-line exposure | CIBA-GEIGY AG (CH) | 1993-11-24 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040013974-A1 | Alkylsulfonyloximes for high-resolution i-line photoresists of high sensitivity | SULT1E1, CCNT1, CCNE1 | SMN1; SMN2 1833/4885ALDH1A1 1150/4885NPSR1 3906/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.