Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.57 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.51 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.51 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.51 |
| ▸ | GAA | P10253 | 1/20 | 0.51 |
| ▸ | PKM | P14618 | 1/20 | 0.51 |
| ▸ | GFER | P55789 | 1/20 | 0.51 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.47 |
| ▸ | NQO2 | P16083 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 3/20 | 0.46 |
| ▸ | HPGD | P15428 | 2/20 | 0.46 |
| ▸ | TSHR | P16473 | 2/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.46 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.46 |
| ▸ | APEX1 | P27695 | 1/20 | 0.46 |
| ▸ | BLM | P54132 | 1/20 | 0.46 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6706162 | 1.00 | SMN1; SMN2 (0.57) | SMN1; SMN2ALDH1A1NPSR1MAPK1HSP90AA1 | |
| SCHEMBL6706161 | 1.00 | SMN1; SMN2 (0.57) | SMN1; SMN2ALDH1A1NPSR1MAPK1HSP90AA1 | |
| SCHEMBL12994619 | 0.85 | NPSR1 (0.47) | SMN1; SMN2ALDH1A1NPSR1MAPK1HSP90AA1 | |
| SCHEMBL10233427 | 0.85 | NPSR1 (0.47) | SMN1; SMN2ALDH1A1NPSR1MAPK1HSP90AA1 | |
| SCHEMBL23504933 | 0.83 | NPSR1 (0.50) | SMN1; SMN2ALDH1A1NPSR1MAPK1HSP90AA1 | |
| SCHEMBL1344768 | 0.83 | NPSR1 (0.50) | SMN1; SMN2ALDH1A1NPSR1MAPK1HSP90AA1 | |
| SCHEMBL12454187 | 0.83 | NPSR1 (0.46) | SMN1; SMN2ALDH1A1NPSR1MAPK1HSP90AA1 | |
| SCHEMBL1344772 | 0.83 | NPSR1 (0.50) | SMN1; SMN2ALDH1A1NPSR1MAPK1HSP90AA1 | |
| SCHEMBL10859395 | 0.81 | SMN1; SMN2 (0.57) | SMN1; SMN2ALDH1A1NPSR1MAPK1KDM4E | |
| SCHEMBL10859399 | 0.81 | SMN1; SMN2 (0.57) | SMN1; SMN2ALDH1A1NPSR1MAPK1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1114 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230287179-A1 | HIGHLY SOLUBLE TRIS-(2,3-EPOXYPROPYL)-ISOCYANURATE AND METHOD FOR PRODUCING SAME | NISSAN CHEMICAL CORPORATION (JP) | 2023-09-14 | — | — | US | disclosed |
| US-11579528-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-02-14 | — | — | US | disclosed |
| US-11561471-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-01-24 | — | — | US | disclosed |
| US-11543749-B2 | Resist composition and method for producing resist pattern, and method for producing plated molded article | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-01-03 | — | — | US | disclosed |
| US-11194252-B2 | Cured film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2021-12-07 | — | — | US | disclosed |
| US-20210278765-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-09-09 | — | — | US | disclosed |
| EP-3745207-B1 | PATTERN-FORMING METHOD USING ELECTRON BEAMS FOR EUV RAYS AND USE OF THIS METHOD FOR FORMING A FINE CIRCUIT OF A SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2021-06-16 | — | — | EP | disclosed |
| US-10969685-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-04-06 | — | — | US | disclosed |
| WO-2021014956-A1 | PHOTOSENSITIVE RESIN COMPOSITION | 日産化学株式会社 | 2021-01-28 | — | — | WO | disclosed |
| US-10890847-B2 | Pattern forming method, resist pattern, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2021-01-12 | — | — | US | disclosed |
| US-20070042290-A1 | resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits | FUJI PHOTO FILM CO., LTD. | 2007-02-22 | — | — | US | disclosed |
| US-20070042290-A1 | resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits | FUJI PHOTO FILM CO., LTD. | 2007-02-22 | — | — | US | disclosed |
| US-7179579-B2 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-20070031757-A1 | Positive photosensitive composition and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. | 2007-02-08 | — | — | US | disclosed |
| US-20070031757-A1 | Positive photosensitive composition and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. | 2007-02-08 | — | — | US | disclosed |
| US-20070026343-A1 | Chemical amplification-type resist composition and production process thereof | FUJI PHOTO FILM CO., LTD. | 2007-02-01 | — | — | US | disclosed |
| US-20070026343-A1 | Chemical amplification-type resist composition and production process thereof | FUJI PHOTO FILM CO., LTD. | 2007-02-01 | — | — | US | disclosed |
| US-20070020559-A1 | Positive-type photosensitive resin composition and cured film manufactured therefrom | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-01-25 | — | — | US | disclosed |
| US-20070020559-A1 | Positive-type photosensitive resin composition and cured film manufactured therefrom | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-01-25 | — | — | US | disclosed |
| US-20070003871-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-01-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230287179-A1 | HIGHLY SOLUBLE TRIS-(2,3-EPOXYPROPYL)-ISOCYANURATE AND METHOD FOR PRODUCING SAME | TTPA, USP1, USP2 | SMN1; SMN2 3817/4885ALDH1A1 874/4885NPSR1 4608/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.