Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NOTUM | Q6P988 | 10/20 | 0.65 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.64 |
| ▸ | MEN1 | O00255 | 1/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.48 |
| ▸ | RXRA | P19793 | 2/20 | 0.44 |
| ▸ | GRIN1 | Q05586 | 2/20 | 0.44 |
| ▸ | GRIN2B | Q13224 | 2/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.44 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.42 |
| ▸ | MGLL | Q99685 | 1/20 | 0.42 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29084878 | 0.98 | NOTUM (0.63) | NOTUMKEAP1MEN1KMT2ARXRA | |
| SCHEMBL14961974 | 0.86 | NOTUM (0.75) | NOTUMKEAP1CYP19A1 | |
| SCHEMBL31588063 | 0.82 | NOTUM (0.45) | NOTUMKEAP1MEN1KMT2ARXRA | |
| SCHEMBL14964134 | 0.80 | NOTUM (0.64) | NOTUMKEAP1CYP19A1 | |
| SCHEMBL7640445 | 0.79 | NOTUM (1.00) | NOTUMKEAP1KMT2AALDH1A1MGLL | |
| SCHEMBL29842378 | 0.79 | NOTUM (1.00) | NOTUMKEAP1KMT2AALDH1A1MGLL | |
| SCHEMBL11410355 | 0.78 | NOTUM (0.64) | NOTUMKEAP1MEN1KMT2AALDH1A1 | |
| SCHEMBL21776982 | 0.78 | KEAP1 (1.00) | NOTUMKEAP1RXRAGRIN1GRIN2B | |
| SCHEMBL3156314 | 0.78 | NOTUM (0.64) | NOTUMKEAP1CYP19A1 | |
| SCHEMBL2733044 | 0.78 | NOTUM (0.64) | NOTUMKEAP1RXRAGRIN1GRIN2B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 179 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12338151-B2 | Treatment of azoles | EVOQUA WATER TECHNOLOGIES LLC (US) | 2025-06-24 | — | — | US | claimed |
| US-20240392194-A1 | Post-Dry Etching Photoresist And Metal Containing Residue Removal Formulation | VERSUM MATERIALS US, LLC | 2024-11-28 | — | — | US | claimed |
| EP-4388069-A1 | POST-DRY ETCHING PHOTORESIST AND METAL CONTAINING RESIDUE REMOVAL FORMULATION | Versum Materials US, LLC (US) | 2024-06-26 | — | — | EP | claimed |
| CN-118159635-A | Post-drying etch photoresist and metal-containing residue removal formulation | 弗萨姆材料美国有限责任公司 | 2024-06-07 | — | — | CN | claimed |
| EP-3688132-B1 | STRIPPER SOLUTIONS AND METHODS OF USING STRIPPER SOLUTIONS | VERSUM MAT US LLC (US) | 2023-06-28 | — | — | EP | claimed |
| WO-2023049688-A1 | POST-DRY ETCHING PHOTORESIST AND METAL CONTAINING RESIDUE REMOVAL FORMULATION | VERSUM MATERIALS US, LLC (US) | 2023-03-30 | — | — | WO | claimed |
| CN-111356759-B | Stripper solution and method of using stripper solution | 弗萨姆材料美国有限责任公司 | 2022-12-20 | — | — | CN | claimed |
| US-20220298045-A1 | Treatment of Azoles | EVOQUA WATER TECHNOLOGIES LLC (US) | 2022-09-22 | — | — | US | claimed |
| CN-114940926-A | Cleaning preparation | 弗萨姆材料美国有限责任公司 | 2022-08-26 | — | — | CN | claimed |
| EP-4021858-A1 | TREATMENT OF AZOLES | Evoqua Water Technologies LLC (US) | 2022-07-06 | — | — | EP | claimed |
| US-7968507-B2 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-06-28 | — | — | US | claimed |
| US-20090084406-A1 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. | 2009-04-02 | — | — | US | claimed |
| EP-1392790-A4 | MONOCARBOXYLIC ACID BASED ANTIFREEZE COMPOSITION | ASHLAND INC (US) | 2008-05-21 | — | — | EP | claimed |
| US-6897150-B1 | Semiconductor wafer surface and method of treating a semiconductor wafer surface | NEC ELECTRONICS CORPORATION (JP) | 2005-05-24 | — | — | US | claimed |
| EP-1159372-A4 | MONOCARBOXYLIC ACID BASED ANTIFREEZE COMPOSITION FOR DIESEL ENGINES | ASHLAND INC (US) | 2005-03-16 | — | — | EP | claimed |
| US-6833109-B1 | Method and apparatus for storing a semiconductor wafer after its CMP polishing | NEC ELECTRONICS CORPORATION (JP) | 2004-12-21 | — | — | US | claimed |
| EP-1392790-A1 | MONOCARBOXYLIC ACID BASED ANTIFREEZE COMPOSITION | Ashland Inc. (US) | 2004-03-03 | — | — | EP | claimed |
| WO-2002090460-A1 | MONOCARBOXYLIC ACID BASED ANTIFREEZE COMPOSITION | ASHLAND INC. (US) | 2002-11-14 | — | — | WO | claimed |
| EP-1159372-A1 | MONOCARBOXYLIC ACID BASED ANTIFREEZE COMPOSITION FOR DIESEL ENGINES | Ashland Inc. (US) | 2001-12-05 | — | — | EP | claimed |
| WO-2000050532-A1 | MONOCARBOXYLIC ACID BASED ANTIFREEZE COMPOSITION FOR DIESEL ENGINES | ASHLAND INC. (US) | 2000-08-31 | — | — | WO | claimed |