Known targets — ChEMBL curated mechanism
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
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 9/20 | 0.37 |
| ▸ | CA2 | P00918 | 9/20 | 0.37 |
| ▸ | CA9 | Q16790 | 8/20 | 0.37 |
| ▸ | CA12 | O43570 | 3/20 | 0.37 |
| ▸ | CA7 | P43166 | 3/20 | 0.37 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.37 |
| ▸ | CA3 | P07451 | 2/20 | 0.37 |
| ▸ | CA4 | P22748 | 2/20 | 0.37 |
| ▸ | CA6 | P23280 | 2/20 | 0.37 |
| ▸ | CA5A | P35218 | 2/20 | 0.37 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.37 |
| ▸ | TSHR | P16473 | 4/20 | 0.36 |
| ▸ | RECQL | P46063 | 2/20 | 0.36 |
| ▸ | GLA | P06280 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.36 |
| ▸ | BLM | P54132 | 1/20 | 0.36 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.34 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL11696003 | 0.98 | CA1 (0.36) | CA1CA2CA9CA12CA7 | |
| Sulfuric Acid SCHEMBL11583750 | 0.98 | CA1 (0.36) | CA1CA2CA9CA12CA7 | |
| Sulfuric Acid SCHEMBL11691425 | 0.98 | CA1 (0.36) | CA1CA2CA9CA12CA7 | |
| Sulfuric Acid SCHEMBL11573317 | 0.98 | CA1 (0.38) | CA1CA2CA9CA12CA7 | |
| Sulfuric Acid SCHEMBL11572351 | 0.98 | CA1 (0.38) | CA1CA2CA9CA12CA7 | |
| SCHEMBL5265569 | 0.90 | TSHR (0.37) | CA1CA2CA9TSHRLPAR3 | |
| SCHEMBL380862 | 0.90 | TSHR (0.37) | CA1CA2CA9TSHRLPAR3 | |
| SCHEMBL15350980 | 0.90 | TSHR (0.37) | CA1CA2CA9TSHRLPAR3 | |
| SCHEMBL10524053 | 0.90 | TSHR (0.37) | CA1CA2CA9TSHRLPAR3 | |
| SCHEMBL9442715 | 0.90 | TSHR (0.37) | CA1CA2CA9TSHRLPAR3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20040072108-A1 | Method of forming resist patterns in a semiconductor device and a semiconductor washing liquid used in said method | HYON MAN-SOK (KR) | 2004-04-15 | — | — | US | claimed |
| WO-2002067304-A1 | A METHOD OF FORMING RESIST PATTERNS IN A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR WASHING LIQUID USED IN SAID METHOD | HYON MAN-SOK (KR) | 2002-08-29 | — | — | WO | claimed |
| US-20040072108-A1 | Method of forming resist patterns in a semiconductor device and a semiconductor washing liquid used in said method | HYON MAN-SOK (KR) | 2004-04-15 | — | — | US | disclosed |
| WO-2002067304-A1 | A METHOD OF FORMING RESIST PATTERNS IN A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR WASHING LIQUID USED IN SAID METHOD | HYON MAN-SOK (KR) | 2002-08-29 | — | — | WO | disclosed |