⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL29163499 | 1.00 | — | — | |
| Fluoride SCHEMBL28284636 | 1.00 | — | — | |
| Fluoride SCHEMBL27634182 | 0.91 | — | — | |
| Fluoride SCHEMBL28530653 | 0.91 | — | — | |
| SCHEMBL24604 | 0.89 | — | — | |
| SCHEMBL444758 | 0.89 | — | — | |
| Hydrochloric Acid SCHEMBL10488807 | 0.80 | — | — | |
| Helium SCHEMBL7068545 | 0.80 | — | — | |
| SCHEMBL3133498 | 0.80 | — | — | |
| Water SCHEMBL2687435 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108640980-B | Protein assembly and preparation method thereof | 中国科学院理化技术研究所 | 2020-12-11 | — | — | CN | claimed |
| CN-117223084-A | Inductively coupled plasma etching apparatus and inductively coupled plasma etching method using the same | 高丽大学校世宗产学协力团 | 2023-12-12 | — | — | CN | disclosed |
| EP-3804020-A1 | MATERIALS AND METHODS FOR COMPONENTS OF LITHIUM BATTERIES | Chen, Lin (US) | 2021-04-14 | — | — | EP | disclosed |
| CN-108640980-B | Protein assembly and preparation method thereof | 中国科学院理化技术研究所 | 2020-12-11 | — | — | CN | disclosed |
| CN-108640980-A | Protein assembly and preparation method thereof | 中国科学院理化技术研究所 | 2018-10-12 | — | — | CN | disclosed |
| CN-102730663-A | Carbon fluoride and application thereof | NORTHWEST INST NUCLEAR TECH | 2012-10-17 | — | — | CN | disclosed |
| CN-102723490-A | Carbon fluoride and application thereof | NORTHWEST INST NUCLEAR TECH | 2012-10-10 | — | — | CN | disclosed |
| CN-1989230-B | Lubricant solution for magnetic recording media, containing fluorinated polyether compound as lubricant | ASAHI GLASS CO LTD | 2010-05-05 | — | — | CN | disclosed |
| CN-100571845-C | Method and system for extracting and storing carbon dioxide by anti-sublimation | ARMINES (FR) | 2009-12-23 | — | — | CN | disclosed |
| CN-101365669-A | Improved fluorination reactor | HONEYWELL INT INC (US) | 2009-02-11 | — | — | CN | disclosed |
| CN-1989230-A | Lubricant solution for magnetic recording media, containing fluorinated polyether compound as lubricant | ASAHI GLASS CO LTD (JP) | 2007-06-27 | — | — | CN | disclosed |
| US-6806185-B2 | Method for forming low dielectric constant damascene structure while employing a carbon doped silicon oxide capping layer | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD (TW) | 2004-10-19 | — | — | US | disclosed |
| US-20040058523-A1 | Method for forming low dielectric constant damascene structure while employing a carbon doped silicon oxide capping layer | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. | 2004-03-25 | — | — | US | disclosed |
| CN-1476346-A | Method and system for extracting carbon dioxide by anti-sublimatin for storage thereof | — | 2004-02-18 | — | — | CN | disclosed |
| US-20020173157-A1 | Dual damascene method employing composite low dielectric constant dielectric layer having intrinsic etch stop characteristics | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. | 2002-11-21 | — | — | US | disclosed |
| US-6248673-B1 | Hydrogen thermal annealing method for stabilizing microelectronic devices | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2001-06-19 | — | — | US | disclosed |
| US-6051505-A | MICROELECTRONICS; FORMING VIA THROUGH SILICON | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY (TW) | 2000-04-18 | — | — | US | disclosed |
| US-5082756-A | Protective coating | MINOLTA CAMERA KABUSHIKI KAISHA (JP) | 1992-01-21 | — | — | US | disclosed |
| US-4028155-A | \"COLD\" PLASMA OF OXYGEN, A HALOGEN COMPOUND, AND A NOBLE GAS CARRIER | LFE CORPORATION (US) | 1977-06-07 | — | — | US | disclosed |