Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4337268 | 0.69 | ALDH1A1 (0.43) | ALDH1A1TSHRMAPK1 | |
| SCHEMBL21378209 | 0.67 | ALDH1A1 (0.41) | ALDH1A1TSHRMAPK1 | |
| SCHEMBL696479 | 0.65 | ALDH1A1 (0.56) | ALDH1A1TSHRMAPK1SMN1; SMN2 | |
| SCHEMBL11651010 | 0.65 | ALDH1A1 (0.55) | ALDH1A1TSHRMAPK1SMN1; SMN2 | |
| SCHEMBL7170116 | 0.65 | ALDH1A1 (0.60) | ALDH1A1TSHRMAPK1SMN1; SMN2 | |
| SCHEMBL9792651 | 0.65 | ALDH1A1 (0.43) | ALDH1A1TSHRMAPK1SMN1; SMN2 | |
| SCHEMBL9792546 | 0.64 | ALDH1A1 (0.40) | ALDH1A1TSHRMAPK1SMN1; SMN2 | |
| SCHEMBL14832617 | 0.64 | ALDH1A1 (0.48) | ALDH1A1TSHRMAPK1SMN1; SMN2 | |
| SCHEMBL28826976 | 0.64 | ALDH1A1 (0.37) | ALDH1A1TSHRMAPK1SMN1; SMN2 | |
| SCHEMBL1700016 | 0.63 | ALDH1A1 (0.64) | ALDH1A1TSHRMAPK1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6673523-B2 | APPLYING PHOTORESIST FILM TO SEMICONDUCTOR SUBSTRATE; IRRADIATION; DEVELOPMENT | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2004-01-06 | — | — | US | disclosed |
| US-20010049075-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2001-12-06 | — | — | US | disclosed |
| EP-1035441-A1 | Pattern formation method | Matsushita Electric Industrial Co., Ltd. (JP) | 2000-09-13 | — | — | EP | disclosed |