Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2145531 | 0.90 | ATM (0.31) | ATM | |
| SCHEMBL17186002 | 0.76 | — | — | |
| SCHEMBL10150935 | 0.67 | SMN1; SMN2 (0.32) | — | |
| SCHEMBL31514270 | 0.65 | ALDH1A1 (0.38) | — | |
| SCHEMBL16105867 | 0.63 | — | — | |
| SCHEMBL19251729 | 0.61 | ATM (0.33) | ATM | |
| SCHEMBL15898403 | 0.61 | ATM (0.33) | ATM | |
| SCHEMBL14544814 | 0.61 | KDM4E (0.44) | ATM | |
| SCHEMBL1104578 | 0.61 | ATM (0.42) | ATM | |
| SCHEMBL17525226 | 0.61 | ATM (0.33) | ATM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6673517-B2 | POLYMER COMPRISING UNITS DERIVED FROM 7-OXABICYCLO(2.2.1)HEPT-2-ENE DERIVATIVES; SENSITIVE TO HIGH-ENERGY RADIATION, RESOLUTION, ETCHING RESISTANCE, AND MINIMIZED SWELL; MICROPATTERNING WITH ELECTRON BEAMS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-01-06 | — | — | US | disclosed |
| US-20020115821-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-08-22 | — | — | US | disclosed |