Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 10/20 | 0.55 |
| ▸ | MAPT | P10636 | 2/20 | 0.53 |
| ▸ | RAB9A | P51151 | 2/20 | 0.53 |
| ▸ | HPGD | P15428 | 1/20 | 0.53 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | HSD17B1 | P14061 | 1/20 | 0.47 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.46 |
| ▸ | GAA | P10253 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.45 |
| ▸ | NPC1 | O15118 | 1/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.45 |
| ▸ | STS | P08842 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11336605 | 0.85 | ELANE (0.75) | ELANEMAPTRAB9AHPGDL3MBTL1 | |
| SCHEMBL20345309 | 0.82 | ELANE (0.59) | ELANEMAPTGAAKMT2A | |
| SCHEMBL6721082 | 0.80 | MAPT (0.59) | ELANEMAPTRAB9AL3MBTL1KMT2A | |
| SCHEMBL9541160 | 0.79 | MAPT (0.55) | ELANEMAPTRAB9AHPGDL3MBTL1 | |
| SCHEMBL9541092 | 0.79 | MAPT (0.55) | ELANEMAPTRAB9AHPGDL3MBTL1 | |
| SCHEMBL6744127 | 0.79 | ELANE (0.59) | ELANEMAPTRAB9AHPGDL3MBTL1 | |
| SCHEMBL6721075 | 0.78 | ELANE (0.53) | ELANEMAPTL3MBTL1NPSR1GAA | |
| SCHEMBL10355780 | 0.76 | MAPT (0.67) | ELANEMAPTRAB9AHPGDL3MBTL1 | |
| SCHEMBL175551 | 0.76 | MAPT (0.67) | ELANEMAPTRAB9AHPGDL3MBTL1 | |
| 4-(Acetate)Acetophenone SCHEMBL1142839 | 0.76 | MAPT (0.67) | ELANEMAPTRAB9AHPGDL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8182975-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-05-22 | — | — | US | disclosed |
| US-8182975-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-05-22 | — | — | US | disclosed |
| US-20080248419-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20080248419-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |