SCHEMBL6722267

SCHEMBL6722267

CC(C)(C)OC(=O)C1CC2C3CCC(C3)C2C1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HRH3 Q9Y5N1 1/20 0.40
CHRM2 P08172 1/20 0.36
CHRM1 P11229 1/20 0.36
CHRM3 P20309 1/20 0.36
BTK Q06187 1/20 0.36
PREP P48147 3/20 0.34
NR1H2 P55055 1/20 0.33
HSD11B1 P28845 1/20 0.33
MAPK1 P28482 1/20 0.33
HPGD P15428 1/20 0.33
CHRNB2 P17787 1/20 0.32
CHRNB4 P30926 1/20 0.32
CHRNA3 P32297 1/20 0.32
CHRNA7 P36544 1/20 0.32
CHRNA4 P43681 1/20 0.32
RECQL P46063 1/20 0.31
MEN1 O00255 1/20 0.30
ALDH1A1 P00352 1/20 0.30
TSHR P16473 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15945489 1.00 HRH3 (0.40) HRH3CHRM2CHRM1CHRM3BTK
SCHEMBL5329004 0.84 CHRNB2 (0.41) HRH3CHRM2CHRM1CHRM3BTK
SCHEMBL1298062 0.81 HRH3 (0.43) HRH3CHRM2CHRM1CHRM3BTK
SCHEMBL1409867 0.80 HRH3 (0.41) HRH3CHRM2CHRM1CHRM3BTK
SCHEMBL12968568 0.79 CHRM2 (0.40) HRH3CHRM2CHRM1CHRM3BTK
SCHEMBL6926352 0.79 CHRM2 (0.40) HRH3CHRM2CHRM1CHRM3BTK
SCHEMBL1586789 0.78 HRH3 (0.41) HRH3CHRM2CHRM1CHRM3BTK
SCHEMBL3637877 0.78 BTK (0.44) HRH3CHRM2CHRM1CHRM3BTK
SCHEMBL6120697 0.78 CHRM2 (0.37) HRH3CHRM2CHRM1CHRM3BTK
SCHEMBL30171988 0.78 HRH3 (0.41) HRH3CHRM2CHRM1CHRM3BTK

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9612535-B2 Pattern forming method, electron beam- or extreme ultraviolet-sensitive resin composition, resist film using the same, method of manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2017-04-04 US disclosed
US-20150370170-A1 PATTERN FORMING METHOD, ELECTRON BEAM- OR EXTREME ULTRAVIOLET-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-12-24 US disclosed
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed