Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 10/20 | 0.74 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.74 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.74 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.74 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.74 |
| ▸ | LMNA | P02545 | 7/20 | 0.60 |
| ▸ | HTT | P42858 | 3/20 | 0.60 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.60 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.60 |
| ▸ | HPGD | P15428 | 5/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.56 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.56 |
| ▸ | RECQL | P46063 | 2/20 | 0.56 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.56 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.51 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.51 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.51 |
| ▸ | PGR | P06401 | 1/20 | 0.51 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.51 |
| ▸ | PDE4A | P27815 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13121658 | 0.91 | MAPT (0.70) | MAPTKDM4EHSD17B10MAPK1ALOX15 | |
| SCHEMBL11443544 | 0.86 | MAPT (0.63) | MAPTKDM4EHSD17B10MAPK1ALOX15 | |
| SCHEMBL11524206 | 0.86 | MAPT (0.61) | MAPTKDM4EHSD17B10MAPK1ALOX15 | |
| SCHEMBL93271 | 0.85 | MAPT (1.00) | MAPTKDM4EHSD17B10MAPK1ALOX15 | |
| Fumaric Acid SCHEMBL11220538 | 0.85 | MAPT (0.62) | MAPTKDM4EHSD17B10MAPK1ALOX15 | |
| SCHEMBL11431486 | 0.84 | MAPT (0.60) | MAPTKDM4EHSD17B10MAPK1ALOX15 | |
| SCHEMBL2060403 | 0.83 | MAPT (0.77) | MAPTKDM4EHSD17B10MAPK1ALOX15 | |
| SCHEMBL6444260 | 0.83 | MAPT (0.77) | MAPTKDM4EHSD17B10MAPK1ALOX15 | |
| SCHEMBL29046142 | 0.81 | MAPT (0.74) | MAPTKDM4EHSD17B10MAPK1ALOX15 | |
| SCHEMBL10549332 | 0.81 | MAPT (0.74) | MAPTKDM4EHSD17B10MAPK1ALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0630758-B1 | Heat-sensitive recording material | MITSUBISHI PAPER MILLS LTD (JP) | 1998-10-07 | — | — | EP | claimed |
| US-5466655-A | STORAGE STABILITY | MITSUBISHI PAPER MILLS LIMITED (JP) | 1995-11-14 | — | — | US | claimed |
| EP-0630758-A2 | Heat-sensitive recording material | MITSUBISHI PAPER MILLS, LTD. (JP) | 1994-12-28 | — | — | EP | claimed |
| EP-3749715-B1 | POLYMER COMPOSITION FOR ROTATIONAL MOULDING | MATRIX POLYMERS LTD (GB) | 2022-04-27 | — | — | EP | disclosed |
| EP-3749715-A1 | POLYMER COMPOSITION FOR ROTATIONAL MOULDING | Matrix Polymers Limited (GB) | 2020-12-16 | — | — | EP | disclosed |
| WO-2019155213-A1 | POLYMER COMPOSITION FOR ROTATIONAL MOULDING | MATRIX POLYMERS LIMITED (GB) | 2019-08-15 | — | — | WO | disclosed |
| EP-2473265-A1 | MASTERBATCH COMPOSITION HAVING A HIGH POLYMER PROCESSING AID | Carolina Color Corporation (US) | 2012-07-11 | — | — | EP | disclosed |
| US-7968632-B2 | Polycarbonate resin composition and process for producing thereof | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2011-06-28 | — | — | US | disclosed |
| US-7919219-B2 | Electrophotographic photosensitive body | HODOGAYA CHEMICAL CO., LTD. (JP) | 2011-04-05 | — | — | US | disclosed |
| US-7919219-B2 | Electrophotographic photosensitive body | HODOGAYA CHEMICAL CO., LTD. (JP) | 2011-04-05 | — | — | US | disclosed |
| WO-2011028206-A1 | MASTERBATCH COMPOSITION HAVING A HIGH POLYMER PROCESSING AID | CAROLINA COLOR CORPOARTION (US) | 2011-03-10 | — | — | WO | disclosed |
| EP-0630758-B1 | Heat-sensitive recording material | MITSUBISHI PAPER MILLS LTD (JP) | 1998-10-07 | — | — | EP | disclosed |
| EP-0813568-A1 | HIGHLY LIGHT-STABLE POLYAMIDE COMPOSITION | NYLTECH FRANCE (FR) | 1997-12-29 | — | — | EP | disclosed |
| WO-1996028503-A1 | HIGHLY LIGHT-STABLE POLYAMIDE COMPOSITION | NYLTECH FRANCE (FR) | 1996-09-19 | — | — | WO | disclosed |
| US-5466655-A | STORAGE STABILITY | MITSUBISHI PAPER MILLS LIMITED (JP) | 1995-11-14 | — | — | US | disclosed |
| EP-0630758-A2 | Heat-sensitive recording material | MITSUBISHI PAPER MILLS, LTD. (JP) | 1994-12-28 | — | — | EP | disclosed |
| EP-0610155-A1 | Stabilized polyamide compositions | CIBA-GEIGY AG (CH) | 1994-08-10 | — | — | EP | disclosed |
| US-4189409-A | LIGHT STABILIZERS, IN THE PRESENCE OF AN ACID CATALYST | ARGUS CHEMICAL CORPORATION (US) | 1980-02-19 | — | — | US | disclosed |
| US-4186151-A | Process for preparing a 5,5'-methylenebis(2-hydroxy-4-alkoxybenzophenone) | ARGUS CHEMICAL CORPORATION (US) | 1980-01-29 | — | — | US | disclosed |
| US-4169089-A | PHOTOSTABILIZERS FOR POLYMERS | ARGUS CHEMICAL CORPORATION (US) | 1979-09-25 | — | — | US | disclosed |