⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20514844 | 0.85 | — | — | |
| SCHEMBL919346 | 0.83 | — | — | |
| SCHEMBL3412613 | 0.81 | — | — | |
| SCHEMBL9279758 | 0.79 | — | — | |
| SCHEMBL23579724 | 0.79 | — | — | |
| SCHEMBL30451202 | 0.79 | — | — | |
| SCHEMBL28029352 | 0.78 | — | — | |
| SCHEMBL190034 | 0.76 | ALOX15 (0.34) | — | |
| SCHEMBL444998 | 0.76 | CYP2C19 (0.36) | — | |
| SCHEMBL2866747 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113797883-B | High-selectivity nickel extraction nano adsorbent and preparation method thereof | 江苏海普功能材料有限公司 | 2023-11-10 | — | — | CN | claimed |
| CN-112755972-B | Preparation of silicon-based resin and application of silicon-based resin as defluorination adsorbent | 江苏海普功能材料有限公司 | 2023-06-27 | — | — | CN | claimed |
| CN-112717892-A | Copper-removing adsorbent for purifying cobalt-nickel electrolyte and preparation method thereof | 江苏海普功能材料有限公司 | 2021-04-30 | — | — | CN | claimed |
| CN-109762464-A | Hydrophobic coating material of high-hardness high-light pool degree of room temperature curing and preparation method thereof | 新辉（中国）新材料有限公司 | 2019-05-17 | — | — | CN | claimed |
| CN-113797883-B | High-selectivity nickel extraction nano adsorbent and preparation method thereof | 江苏海普功能材料有限公司 | 2023-11-10 | — | — | CN | disclosed |
| CN-112755972-B | Preparation of silicon-based resin and application of silicon-based resin as defluorination adsorbent | 江苏海普功能材料有限公司 | 2023-06-27 | — | — | CN | disclosed |
| CN-113000028-A | Preparation method of adsorbent for recovering phosphoric acid in waste acid | 临沂海普新材料科技有限公司 | 2021-06-22 | — | — | CN | disclosed |
| CN-109777292-B | High-hardness high-glossiness hydrophobic coating material for substrate surface and application method thereof | 新辉（中国）新材料有限公司 | 2021-05-04 | — | — | CN | disclosed |
| CN-109762464-B | Room-temperature-cured high-hardness high-glossiness hydrophobic coating material and preparation method thereof | 新辉（中国）新材料有限公司 | 2021-04-30 | — | — | CN | disclosed |
| EP-3122328-B1 | SILANE CONTAINING RESPECTIVELY AT LEAST TWO ALKOXY GROUPS AND A GUANIDONO OR CARBAMIDE GROUP | EVONIK DEGUSSA GMBH (DE) | 2019-05-01 | — | — | EP | disclosed |
| EP-3122328-A1 | SILANE CONTAINING RESPECTIVELY AT LEAST TWO ALKOXY GROUPS AND A GUANIDONO OR CARBAMIDE GROUP | Evonik Degussa GmbH (DE) | 2017-02-01 | — | — | EP | disclosed |
| WO-2015144384-A1 | SILANE CONTAINING RESPECTIVELY AT LEAST TWO ALKOXY GROUPS AND A GUANIDONO OR CARBAMIDE GROUP | EVONIK DEGUSSA GMBH (DE) | 2015-10-01 | — | — | WO | disclosed |
| EP-2646880-A1 | TWO-COMPONENT DEVELOPER | Canon Kabushiki Kaisha (JP) | 2013-10-09 | — | — | EP | disclosed |
| CN-102863609-A | Organic silicon curing agent for epoxy floor paint and preparation method and application thereof | CAS GUANGZHOU CHEMISTRY CO LTD | 2013-01-09 | — | — | CN | disclosed |
| WO-2012074035-A1 | TWO-COMPONENT DEVELOPER | CANON KABUSHIKI KAISHA (JP) | 2012-06-07 | — | — | WO | disclosed |
| US-20040248015-A1 | Carrier for electrophotography developers, developer prepared by using the carrier and method for forming image | MITSUI MINING & SMELTING CO., LTD. | 2004-12-09 | — | — | US | disclosed |