SCHEMBL6735573

SCHEMBL6735573

Cc1ccc(S(=O)(=O)[O-])cc1.O=C(C[S+]1CCOCC1)C1CCCCC1

nearest known ligand 0.43

Known targets — ChEMBL curated mechanism

CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CYP2C9 P11712 1/20 0.43
ALDH1A1 P00352 4/20 0.40
ENPP3 O14638 2/20 0.40
ENPP1 P22413 2/20 0.40
ENPP2 Q13822 2/20 0.40
KMT2A Q03164 3/20 0.38
MEN1 O00255 2/20 0.38
ADORA3 P0DMS8 1/20 0.38
TSHR P16473 2/20 0.36
CYP3A4 P08684 1/20 0.36
POLB P06746 1/20 0.36
LMNA P02545 1/20 0.36
EPHX2 P34913 1/20 0.36
L3MBTL1 Q9Y468 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6727729 0.99 CYP2C9 (0.41) CYP2C9ALDH1A1ENPP3ENPP1ENPP2
SCHEMBL6549852 0.90 ALDH1A1 (0.43) CYP2C9ALDH1A1ENPP3ENPP1ENPP2
SCHEMBL6551381 0.90 ALDH1A1 (0.43) CYP2C9ALDH1A1ENPP3ENPP1ENPP2
SCHEMBL6550488 0.90 ALDH1A1 (0.43) CYP2C9ALDH1A1ENPP3ENPP1ENPP2
SCHEMBL6550721 0.89 ALDH1A1 (0.41) CYP2C9ALDH1A1ENPP3ENPP1ENPP2
SCHEMBL6728428 0.86 ALDH1A1 (0.40) CYP2C9ALDH1A1ENPP3ENPP1ENPP2
SCHEMBL6727473 0.86 ALDH1A1 (0.40) CYP2C9ALDH1A1ENPP3ENPP1ENPP2
SCHEMBL6723151 0.85 ALDH1A1 (0.39) CYP2C9ALDH1A1ENPP3ENPP1ENPP2
SCHEMBL6726120 0.85 ALDH1A1 (0.39) CYP2C9ALDH1A1ENPP3ENPP1ENPP2
SCHEMBL6733943 0.82 L3MBTL1 (0.41) CYP2C9ALDH1A1KMT2ATSHRCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed