SCHEMBL6736708

SCHEMBL6736708

C[S+](CC(=O)C(C)(C)C)C1CCCCC1.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.30

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.30
LMNA P02545 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6731916 0.99 CA1 (0.31)
SCHEMBL6549406 0.88 CA1 (0.31)
Trifluoromethanesulfonic Acid SCHEMBL7160158 0.87 ALDH1A1 (0.33) ALDH1A1LMNASMN1; SMN2
SCHEMBL6550524 0.86 CA2 (0.33)
SCHEMBL6725740 0.85
SCHEMBL6734007 0.85
SCHEMBL6549881 0.85
SCHEMBL6726319 0.84 CA1 (0.31)
SCHEMBL6549424 0.84 CA1 (0.31)
SCHEMBL6549509 0.84 CA1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed