SCHEMBL6739360

SCHEMBL6739360

C=C(C)C(=O)Oc1ccc(C(c2ccc(O)cc2)(C(F)(F)F)C(F)(F)F)cc1

nearest known ligand 0.53

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.53
ESR2 Q92731 1/20 0.53
ELANE P08246 4/20 0.47
KMT2A Q03164 2/20 0.43
ATM Q13315 1/20 0.43
KIF11 P52732 2/20 0.36
MAOB P27338 1/20 0.34
MIF P14174 1/20 0.33
BCHE P06276 1/20 0.33
CHRM2 P08172 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL373661 0.94 ELANE (0.51) ESR1ESR2ELANEKMT2AATM
SCHEMBL20312049 0.88 ELANE (0.47) ESR1ESR2ELANEKMT2AATM
SCHEMBL26342151 0.87 ELANE (0.46) ESR1ESR2ELANEKMT2AATM
SCHEMBL21470089 0.86 ELANE (0.44) ESR1ESR2ELANEKMT2AATM
SCHEMBL25695914 0.84 ELANE (0.46) ESR1ESR2ELANEKMT2AATM
SCHEMBL72362 0.84 ELANE (0.61) ESR1ESR2ELANEKMT2AATM
SCHEMBL21469986 0.83 ELANE (0.43) ELANEKMT2AATMMAOB
SCHEMBL51951 0.83 ESR1 (0.52) ESR1ESR2ELANEKMT2AATM
SCHEMBL7213144 0.82 THRB (0.49) ELANEKMT2AATMMAOB
SCHEMBL10395579 0.81 ESR1 (0.44) ESR1ESR2ELANEKMT2AATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6686123-B2 ADHESIVENESS TO A WAFER, AND IS DEVELOPABLE IN AQUEOUS TETRAMETHYLAMMONIUM HYDROXIDE SOLUTION, SUITABLE FOR PHOTOLITHOGRAPHY HYNIX SEMICONDUCTOR INC (KR) 2004-02-03 US disclosed
US-6627383-B2 4-(2-(4-hydroxyphenyl)-1,1,1,3,3,3-hexafluoropropyl)phenyl methacrylate and styrene copolymers HYNIX SEMICONDUCTOR INC (KR) 2003-09-30 US disclosed
US-20020061466-A1 Photoresist monomer, polymer thereof and photoresist composition containing the same HYNIX SEMICONDUCTOR INC. (KR) 2002-05-23 US disclosed
US-20020051940-A1 Photoresist monomer comprising bisphenol derivatives and polymers thereof HYNIX SEMICONDUCTOR INC. (KR) 2002-05-02 US disclosed