Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 4/20 | 0.61 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.56 |
| ▸ | ATM | Q13315 | 1/20 | 0.56 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 3/20 | 0.41 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | ESR1 | P03372 | 1/20 | 0.41 |
| ▸ | GAA | P10253 | 2/20 | 0.41 |
| ▸ | XBP1 | P17861 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | GLA | P06280 | 1/20 | 0.40 |
| ▸ | THRB | P10828 | 1/20 | 0.40 |
| ▸ | BLM | P54132 | 1/20 | 0.40 |
| ▸ | CASP6 | P55212 | 1/20 | 0.40 |
| ▸ | GFER | P55789 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | PREP | P48147 | 2/20 | 0.39 |
| ▸ | CELA1 | Q9UNI1 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL217004 | 0.94 | ELANE (0.56) | ELANEKMT2AATMLMNAMAPT | |
| Methacrylic Acid SCHEMBL8512987 | 0.94 | ELANE (0.60) | ELANEKMT2AATMLMNAMAPT | |
| SCHEMBL27243146 | 0.93 | ELANE (0.54) | ELANEKMT2AATMLMNAMAPT | |
| SCHEMBL56436 | 0.91 | ELANE (0.69) | ELANEKMT2AATMLMNAMAPT | |
| SCHEMBL19985115 | 0.91 | ELANE (0.76) | ELANEKMT2AATMLMNAMAPT | |
| Hydroquinone SCHEMBL28395727 | 0.89 | ELANE (0.64) | ELANEKMT2AATMMAPTTDP1 | |
| SCHEMBL51951 | 0.88 | ESR1 (0.52) | ELANEKMT2AATMLMNAMAPT | |
| SCHEMBL587543 | 0.88 | ESR1 (0.52) | ELANEKMT2AATMLMNAMAPT | |
| SCHEMBL7202624 | 0.88 | ELANE (0.62) | ELANEKMT2AATMLMNAMAPT | |
| SCHEMBL3402161 | 0.88 | ELANE (0.50) | ELANEKMT2AATMLMNAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3369 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4733840-A1 | PHOTOSENSITIVE RESIN COMPOSITION, FILM-SHAPED RESIN, AND RESIN SHEET | Resonac Corporation (JP) | 2026-04-29 | — | — | EP | claimed |
| CN-121574536-A | Bio-based modified polymer material and preparation method thereof | 乐捷家居股份有限公司 | 2026-02-27 | — | — | CN | claimed |
| EP-4654315-A1 | ELECTROLYTIC SOLUTION CONTAINING POLYCARBONATE RESIN AND ELECTROLYTE OBTAINED THEREFROM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-11-26 | — | — | EP | claimed |
| US-12441051-B2 | One part, catalyst containing, moisture curable dual cure resins for additive manufacturing | CARBON, INC. (US) | 2025-10-14 | — | — | US | claimed |
| US-12429638-B2 | Method for producing infrared light cut filter, filter for solid-state imaging device, and solid-state imaging device | TOPPAN INC. (JP) | 2025-09-30 | — | — | US | claimed |
| CN-120059029-A | Vinyl acetate copolymer and preparation method and application thereof | 云南正邦科技有限公司 | 2025-05-30 | — | — | CN | claimed |
| CN-120059828-A | Surface-functionalized two-dimensional nanomaterial with high dispersion stability and preparation method and application thereof | 中国科学院兰州化学物理研究所 | 2025-05-30 | — | — | CN | claimed |
| WO-2025013535-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, PARTITION WALL, AND OPTICAL ELEMENT | ＡＧＣ株式会社 | 2025-01-16 | — | — | WO | claimed |
| WO-2025004836-A1 | PHOTOSENSITIVE RESIN COMPOSITION, FILM-SHAPED RESIN, AND RESIN SHEET | 株式会社レゾナック | 2025-01-02 | — | — | WO | claimed |
| CN-115151586-B | Single part moisture curable resin for additive manufacturing | 卡本有限公司 | 2024-09-20 | — | — | CN | claimed |
| EP-0447829-A2 | Coloured positive working light sensitive recording material and process for the production of a colour proofing image using this material | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-09-25 | — | — | EP | claimed |
| EP-0155652-B2 | PHOTOPOLYMERIZABLE MIXTURE AND RECORDING MATERIAL PRODUCED FROM IT | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-07-10 | — | — | EP | claimed |
| US-4731316-A | DIAZO RESIN, OLEOPHILIC, HIGH MOLECULAR WEIGHT ACID | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) | 1988-03-15 | — | — | US | claimed |
| EP-0155652-B1 | PHOTOPOLYMERIZABLE MIXTURE AND RECORDING MATERIAL PRODUCED FROM IT | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-01-07 | — | — | EP | claimed |
| US-4699867-A | Radiation-sensitive positive working composition and material with aqueous-alkaline soluble acryamide or methacryamide copolymer having hydroxyl or carboxyl groups | HOECHST AKTIENGESELLSCHAFT (DE) | 1987-10-13 | — | — | US | claimed |
| US-4604342-A | BINDER, PHOTOINITIATOR, AND ETHYLENICALLY UNSATURATED MONOMER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-08-05 | — | — | US | claimed |
| EP-0155652-A2 | Photopolymerizable mixture and recording material produced from it | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-09-25 | — | — | EP | claimed |
| EP-0066452-A2 | Photosensitive composition for photosensitive printing plate | KONICA CORPORATION (JP) | 1982-12-08 | — | — | EP | claimed |
| US-4032592-A | G-METHACRYLOYLOXYPROPYL TRIMETHOXYSILANE MODIFIER | UBE INDUSTRIES, LTD. (JA) | 1977-06-28 | — | — | US | claimed |
| US-3970722-A | Method for preparing a modified crystalline propylene polymer | UBE INDUSTRIES, LTD. (JA) | 1976-07-20 | — | — | US | claimed |