Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 10/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.53 |
| ▸ | MAPT | P10636 | 8/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 7/20 | 0.53 |
| ▸ | HPGD | P15428 | 7/20 | 0.53 |
| ▸ | VDR | P11473 | 3/20 | 0.53 |
| ▸ | F2 | P00734 | 4/20 | 0.49 |
| ▸ | MEN1 | O00255 | 4/20 | 0.49 |
| ▸ | HTT | P42858 | 3/20 | 0.49 |
| ▸ | XBP1 | P17861 | 2/20 | 0.49 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.49 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.49 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.49 |
| ▸ | LMNA | P02545 | 2/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.49 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.49 |
| ▸ | CASP3 | P42574 | 1/20 | 0.43 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | MAP2K7 | O14733 | 1/20 | 0.38 |
| ▸ | GMNN | O75496 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5370317 | 0.86 | KDM4E (0.56) | KDM4EALDH1A1MAPTKMT2AHPGD | |
| SCHEMBL7642865 | 0.76 | KMT2A (0.57) | KDM4EALDH1A1MAPTKMT2AHPGD | |
| SCHEMBL66141 | 0.76 | KDM4E (0.61) | KDM4EALDH1A1MAPTKMT2AHPGD | |
| SCHEMBL29217852 | 0.75 | ALDH1A1 (0.66) | KDM4EALDH1A1MAPTKMT2AHPGD | |
| SCHEMBL6809828 | 0.74 | GSK3A (0.31) | — | |
| SCHEMBL7776318 | 0.73 | ALDH1A1 (0.59) | KDM4EALDH1A1MAPTKMT2AHPGD | |
| SCHEMBL11025467 | 0.72 | ALDH1A1 (0.61) | KDM4EALDH1A1MAPTKMT2AHPGD | |
| SCHEMBL9064541 | 0.72 | ALDH1A1 (0.61) | KDM4EALDH1A1MAPTKMT2AHPGD | |
| SCHEMBL11023526 | 0.71 | KDM4E (0.56) | KDM4EALDH1A1MAPTKMT2AHPGD | |
| SCHEMBL11026414 | 0.71 | ALDH1A1 (0.56) | KDM4EALDH1A1MAPTKMT2AHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240302743-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-09-12 | — | — | US | disclosed |
| WO-2022138648-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2022-06-30 | — | — | WO | disclosed |
| CN-112987497-A | Resist composition and resist pattern forming method | 东京应化工业株式会社 | 2021-06-18 | — | — | CN | disclosed |
| US-6835530-B2 | Base material for lithography | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-12-28 | — | — | US | disclosed |
| US-20040121260-A1 | Base material for lithography | TOKYO OHKA KOGYO CO., LTD. | 2004-06-24 | — | — | US | disclosed |
| US-6689535-B2 | A NOVALAK RESIN CROSSLINKING AGENT HAVING HYDROXYALKYL AND/OR ALKOXYALKYL GROUPS AND AN ACIDIC COMPOUND; UNDERCOATINGS; A RECTANGULAR CROSS-SECTIONAL PROFILE WITHOUT CAUSING FOOTING, UNDERCUTTING, ETC. AT THE BOTTOM | TOKYO OHKA KOGYO CO., LTD (JP) | 2004-02-10 | — | — | US | disclosed |
| US-20020055064-A1 | Anti-reflective coating composition, multilayer photoresist material using the same, and method for forming pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-05-09 | — | — | US | disclosed |
| US-6042988-A | ALKALI-SOLUBLE RESIN, A COMPOUND CAPABLE OF GENERATING AN ACID BY IRRADIATION AND A CROSSLINKING AGENT, AND FURTHER CONTAINS AN ORGANIC CARBOXYLIC ACID AS ACIDIC COMPOUND AND ORGANIC AMINE AS ALKALINE COMPOUND; DEFINITION AND PRECISION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-03-28 | — | — | US | disclosed |