⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL622054 | 0.73 | — | — | |
| SCHEMBL675609 | 0.71 | ALDH1A1 (0.35) | — | |
| SCHEMBL7543226 | 0.69 | ALDH1A1 (0.38) | — | |
| SCHEMBL9025449 | 0.69 | — | — | |
| SCHEMBL19133543 | 0.69 | — | — | |
| SCHEMBL9231072 | 0.69 | — | — | |
| SCHEMBL4450624 | 0.69 | — | — | |
| SCHEMBL5676036 | 0.69 | SOAT1 (0.41) | — | |
| SCHEMBL5676044 | 0.69 | SOAT1 (0.41) | — | |
| SCHEMBL9754549 | 0.67 | ALDH1A1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12609210-B2 | Curable composition and cured body of same | TOKUYAMA CORPORATION (JP) | 2026-04-21 | — | — | US | disclosed |
| US-12434265-B2 | Coating method | TOKUYAMA CORPORATION (JP) | 2025-10-07 | — | — | US | disclosed |
| US-20250215256-A1 | POLYMER FILM-FORMING COMPOSITION AND SELECTIVE POLYMER FILM-FORMING METHOD | NISSAN CHEMICAL CORPORATION (JP) | 2025-07-03 | — | — | US | disclosed |
| WO-2025047501-A1 | POLYSILSESQUIOXANE LIQUID PRECURSOR, CURED OBJECT, AND PRODUCTION METHODS THEREFOR | ＡＧＣ株式会社 | 2025-03-06 | — | — | WO | disclosed |
| EP-4503100-A1 | POLYMER FILM-FORMING COMPOSITION AND SELECTIVE POLYMER FILM-FORMING METHOD | Nissan Chemical Corporation (JP) | 2025-02-05 | — | — | EP | disclosed |
| CN-118619283-A | Preparation method of monodisperse hydrophobic silica microspheres | 中欧电子材料国际创新中心(合肥)有限公司 | 2024-09-10 | — | — | CN | disclosed |
| CN-115702176-B | Curable composition and cured product thereof | 株式会社德山 | 2024-05-03 | — | — | CN | disclosed |
| CN-116887981-A | Laminated film, method for producing laminated film, laminated body, and method for producing laminated body | 东洋纺株式会社 | 2023-10-13 | — | — | CN | disclosed |
| WO-2023190750-A1 | POLYMER FILM-FORMING COMPOSITION AND SELECTIVE POLYMER FILM-FORMING METHOD | 日産化学株式会社 | 2023-10-05 | — | — | WO | disclosed |
| US-20230260669-A1 | CURABLE COMPOSITION AND CURED BODY OF SAME | TOKUYAMA CORPORATION (JP) | 2023-08-17 | — | — | US | disclosed |
| EP-1561571-A1 | PROCESS FOR PRODUCING PHOTOCHROMIC LAYERED PRODUCT | TOKUYAMA CORPORATION (JP) | 2005-08-10 | — | — | EP | disclosed |
| EP-1535980-A1 | PHOTOCHROMIC COMPOSITION | Tokuyama Corporation (JP) | 2005-06-01 | — | — | EP | disclosed |
| US-20040220292-A1 | Curable composition, cured article obtained therefrom, and photochromic optical material and process for producing the same | TOKUYAMA CORPORATION (JP) | 2004-11-04 | — | — | US | disclosed |
| US-6802993-B2 | POLYFUNCTIONAL ACRYLATE MONOMER, A SECOND RADICALLY POLYMERIZABLE MONOMER HAVING A SILANOL GROUP FOR EXCELLENT ADHESION TO A HARD COAT, AND A THIRD MONOMER; HIGH COLOR DENSITY AND FADING SPEED; PLASTIC LENSES | TOKUYAMA CORPORATION (JP) | 2004-10-12 | — | — | US | disclosed |
| US-20040173782-A1 | Photochromic composition | TOKUYAMA CORPORATION (JP) | 2004-09-09 | — | — | US | disclosed |
| CN-1160326-C | Process for prodcing 3-aryl sulfate iso-hydroximic acid | - | 2004-08-04 | — | — | CN | disclosed |
| EP-1433814-A1 | CURABLE COMPOSITION, CURED ARTICLE OBTAINED THEREFROM, AND PHOTOCHROMIC OPTICAL MATERIAL AND PROCESS FOR PRODUCING THE SAME | Tokuyama Corporation (JP) | 2004-06-30 | — | — | EP | disclosed |
| EP-1293522-A1 | CURABLE COMPOSITION COMPRISING PHOTOCHROMIC COMPOUND | TOKUYAMA CORPORATION (JP) | 2003-03-19 | — | — | EP | disclosed |
| US-20030036579-A1 | Curable composition comprising a photochromic compound | TOKUYAMA CORPORATION (JP) | 2003-02-20 | — | — | US | disclosed |
| CN-1101809-C | Process for preparing 3-arylsulfur hydroxamic acids | HOFFMANN LA ROCHE (CH) | 2003-02-19 | — | — | CN | disclosed |