SCHEMBL6761969

SCHEMBL6761969

O=C(Cc1ccccc1)OC1CCC1

nearest known ligand 0.66

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 5/20 0.66
ALDH1A1 P00352 3/20 0.50
MAPK1 P28482 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
F2 P00734 1/20 0.49
PRSS1 P07477 1/20 0.49
HPGD P15428 2/20 0.49
GLA P06280 1/20 0.49
PAM P19021 1/20 0.49
MGLL Q99685 2/20 0.48
EPHX2 P34913 1/20 0.47
TSHR P16473 1/20 0.47
STS P08842 1/20 0.47
KDM4E B2RXH2 1/20 0.47
HSD17B10 Q99714 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5049441 0.96 CYP19A1 (0.71) CYP19A1ALDH1A1MAPK1L3MBTL1HPGD
SCHEMBL27820726 0.95 CYP19A1 (0.71) CYP19A1ALDH1A1MAPK1L3MBTL1HPGD
SCHEMBL1301606 0.95 CYP19A1 (0.71) CYP19A1ALDH1A1MAPK1L3MBTL1HPGD
Toluene SCHEMBL28164691 0.89 CYP19A1 (0.61) CYP19A1ALDH1A1MAPK1L3MBTL1HPGD
SCHEMBL17684940 0.87 CYP19A1 (0.63) CYP19A1ALDH1A1HPGDMGLLTSHR
SCHEMBL27280787 0.86 CYP19A1 (0.54) CYP19A1ALDH1A1MAPK1L3MBTL1PAM
SCHEMBL17737185 0.85 CYP19A1 (0.64) CYP19A1ALDH1A1HPGDMGLLEPHX2
SCHEMBL17737149 0.85 CYP19A1 (0.64) CYP19A1ALDH1A1HPGDMGLLEPHX2
SCHEMBL8908923 0.85 CYP19A1 (0.53) CYP19A1ALDH1A1MAPK1L3MBTL1PAM
SCHEMBL29099957 0.85 CYP19A1 (0.53) CYP19A1ALDH1A1MAPK1L3MBTL1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103923765-A Detergent Composition For Process Of Manufacturing Semiconductors And Displays COWON INNOTECH INC 2014-07-16 CN claimed
US-6797745-B1 Hot melt inks containing styrene or terpene polymers XEROX CORPORATION 2004-09-28 US claimed
US-6398857-B1 ACCUSTIC PIEZOELECTRIC; HOT MELT INK JET PRINTING; BENZOIC ACID VEHICLE; ALKYL OR PHENYL CARBOXYLIC ACID VISCOSITY MODIFIER; RETAINS DESIRED HARDNESS XEROX CORPORATION 2002-06-04 US claimed
CN-109054648-A Serosity combination for chemically mechanical polishing LTCAM有限公司 2018-12-21 CN disclosed
CN-104419326-A Slurry composition for chemical mechanical polishing COWON INNOTECH INC 2015-03-18 CN disclosed
CN-103923765-A Detergent Composition For Process Of Manufacturing Semiconductors And Displays COWON INNOTECH INC 2014-07-16 CN disclosed
CN-1751025-B Diamine derivatives DAIICHI SEIYAKU CO 2010-05-12 CN disclosed
US-6797745-B1 Hot melt inks containing styrene or terpene polymers XEROX CORPORATION 2004-09-28 US disclosed
US-6398857-B1 ACCUSTIC PIEZOELECTRIC; HOT MELT INK JET PRINTING; BENZOIC ACID VEHICLE; ALKYL OR PHENYL CARBOXYLIC ACID VISCOSITY MODIFIER; RETAINS DESIRED HARDNESS XEROX CORPORATION 2002-06-04 US disclosed
CN-1226886-A Arylcycloalkane carboxylic acid esters, their use, pharmaceutical compositions and process for their preparation PHARMACIA & UPJOHN AB (SE) 1999-08-25 CN disclosed