⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1131452 | 0.88 | — | — | |
| SCHEMBL6762914 | 0.77 | — | — | |
| SCHEMBL12354909 | 0.76 | — | — | |
| SCHEMBL16808762 | 0.76 | TSHR (0.31) | — | |
| SCHEMBL21904681 | 0.75 | PPP5C (0.45) | — | |
| SCHEMBL15356255 | 0.73 | TSHR (0.33) | — | |
| SCHEMBL15356256 | 0.73 | TSHR (0.31) | — | |
| SCHEMBL2571985 | 0.72 | ALDH1A1 (0.34) | — | |
| SCHEMBL15356257 | 0.71 | MAPT (0.44) | — | |
| SCHEMBL13403138 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4662272-A1 | PROCESS FOR RECYCLING POLYTHIOURETHANES, THIO COMPOUNDS, AND USE THEREOF | Bruno Bock GmbH (DE) | 2025-12-17 | — | — | EP | disclosed |
| WO-2024165233-A1 | PROCESS FOR RECYCLING POLYTHIOURETHANES, THIO COMPOUNDS, AND USE THEREOF | BRUNO BOCK GMBH (DE) | 2024-08-15 | — | — | WO | disclosed |
| US-20240210831-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240210831-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-27 | — | — | US | disclosed |
| EP-3266578-B1 | DRY FIBROUS MATERIAL FOR SUBSEQUENT RESIN INFUSION | CYTEC IND INC (US) | 2020-07-15 | — | — | EP | disclosed |
| US-10583615-B2 | Dry fibrous tape for manufacturing preform | CYTEC INDUSTRIES INC. (US) | 2020-03-10 | — | — | US | disclosed |
| WO-2020045358-A1 | COMPOSITION, ADHESIVE INCLUDING SAME, CURED OBJECT OBTAINED THEREFROM, AND PRODUCTION METHOD THEREFOR | 株式会社ADEKA | 2020-03-05 | — | — | WO | disclosed |
| US-10369773-B2 | Dry fibrous material for subsequent resin infusion | CYTEC INDUSTRIES INC. (US) | 2019-08-06 | — | — | US | disclosed |
| EP-3266917-B1 | METHOD OF MAKING A SLIT TAPE OR TOW | CYTEC IND INC (US) | 2019-04-17 | — | — | EP | disclosed |
| EP-3160720-B1 | DRY FIBROUS TAPE FOR MANUFACTURING PREFORM | CYTEC IND INC (US) | 2018-11-21 | — | — | EP | disclosed |
| EP-3266917-A1 | METHOD OF MAKING A SLIT TAPE OR TOW | Cytec Industries Inc. (US) | 2018-01-10 | — | — | EP | disclosed |
| EP-3160720-A2 | DRY FIBROUS TAPE FOR MANUFACTURING PREFORM | Cytec Industries Inc. (US) | 2017-05-03 | — | — | EP | disclosed |
| US-20160303842-A1 | DRY FIBROUS MATERIAL FOR SUBSEQUENT RESIN INFUSION | CYTEC INDUSTRIES INC. (US) | 2016-10-20 | — | — | US | disclosed |
| US-9393758-B2 | Dry fibrous material for subsequent resin infusion | CYTEC INDUSTRIES INC. (US) | 2016-07-19 | — | — | US | disclosed |
| US-20150375461-A1 | DRY FIBROUS TAPE FOR MANUFACTURING PREFORM | CYTEC INDUSTRIES INC. (US) | 2015-12-31 | — | — | US | disclosed |
| US-20140370237-A1 | DRY FIBROUS MATERIAL FOR SUBSEQUENT RESIN INFUSION | CYTEC INDUSTRIES INC. | 2014-12-18 | — | — | US | disclosed |
| EP-2794221-A2 | DRY FIBROUS MATERIAL FOR SUBSEQUENT RESIN INFUSION | Cytec Industries Inc. (US) | 2014-10-29 | — | — | EP | disclosed |
| WO-2013096377-A2 | DRY FIBROUS MATERIAL FOR SUBSEQUENT RESIN INFUSION | CYTEC INDUSTRIES INC. (US) | 2013-06-27 | — | — | WO | disclosed |
| US-6774250-B1 | IN PRESENCE OF HETEROGENEOUS SURFACE-ACTIVE CATALYST SELECTED FROM ACTIVATED ALUMINUM HYDROXIDE, HYDRATED ALUMINUM OXIDE, AMORPHOUS SILICA, ACTIVATED CARBON AND CATIONIC ION EXCHANGE RESINS AND ISOLATING | HUNTSMAN ADVANCED MATERIALS AMERICAS INC. | 2004-08-10 | — | — | US | disclosed |
| EP-0255989-A1 | Negative photoresist on the basis of polyphenols and epoxide compounds or vinyl ethers | CIBA-GEIGY AG (CH) | 1988-02-17 | — | — | EP | disclosed |