SCHEMBL676351

SCHEMBL676351

C=C(CC(C)C1CCCCC1)C(=O)O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.44
TET2 Q6N021 4/20 0.39
TET3 O43151 1/20 0.39
TET1 Q8NFU7 1/20 0.39
GRIK1 P39086 1/20 0.38
GRIK2 Q13002 1/20 0.38
GRM1 Q13255 1/20 0.38
GRM2 Q14416 1/20 0.38
EPHX1 P07099 3/20 0.35
CA12 O43570 2/20 0.35
CA1 P00915 2/20 0.35
CA2 P00918 2/20 0.35
MMP2 P08253 2/20 0.35
CA9 Q16790 2/20 0.35
MEN1 O00255 1/20 0.34
MITF O75030 1/20 0.34
KMT2A Q03164 1/20 0.34
GPBAR1 Q8TDU6 1/20 0.34
NR1H4 Q96RI1 1/20 0.34
KDM4E B2RXH2 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23494790 0.98 ALDH1A1 (0.42) ALDH1A1TET2TET3TET1GRIK1
SCHEMBL5429709 0.82 ALDH1A1 (0.39) ALDH1A1EPHX1CA12CA1CA2
SCHEMBL16267285 0.81 ALDH1A1 (0.47) ALDH1A1TET2TET3TET1GRIK1
SCHEMBL8651989 0.80 ALDH1A1 (0.55) ALDH1A1EPHX1CA12CA1CA2
SCHEMBL1208925 0.80 ALDH1A1 (0.55) ALDH1A1EPHX1CA12CA1CA2
SCHEMBL6808670 0.80 ALDH1A1 (0.55) ALDH1A1EPHX1CA12CA1CA2
SCHEMBL6769503 0.78 ALDH1A1 (0.42) ALDH1A1EPHX1CA12CA1CA2
SCHEMBL15910900 0.77 ALDH1A1 (0.41) ALDH1A1TET2TET3TET1GRIK1
SCHEMBL17715691 0.76 ALDH1A1 (0.42) ALDH1A1EPHX1CA12CA1CA2
SCHEMBL4742218 0.76 ALDH1A1 (0.42) ALDH1A1EPHX1CA12CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
EP-1179750-B1 Positive photosensitive composition and method for producing a precision integrated circuit element using the same FUJIFILM CORP (JP) 2012-07-25 EP disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
EP-2399168-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM Corporation (JP) 2011-12-28 EP disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed
US-6492091-B2 ACTINIC RAY OR RADIATION ACID GENERATOR, A RESIN CONTAINING A MONOCYCLIC OR POLYCYCLIC HYDROCARBON STRUCTURE, AND AN ONIUM SALT OF A CARBOXYLIC ACID; FOR MICROPHOTOFABRICATION USING A DEEP ULTRAVIOLET RAY FUJI PHOTO FILM CO., LTD. (JP) 2002-12-10 US disclosed
US-20020051933-A1 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. 2002-05-02 US disclosed
EP-1179750-A1 Positive photosensitive composition Fuji Photo Film Co., Ltd. (JP) 2002-02-13 EP disclosed