SCHEMBL5429709

SCHEMBL5429709

C=C(CCC(C)C1CCCCC1)C(=O)O

nearest known ligand 0.39

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.39
KMT2A Q03164 2/20 0.35
MEN1 O00255 1/20 0.35
MITF O75030 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
EPHX1 P07099 6/20 0.33
CA12 O43570 2/20 0.33
CA1 P00915 2/20 0.33
CA2 P00918 2/20 0.33
MMP2 P08253 2/20 0.33
CA9 Q16790 2/20 0.33
HPGD P15428 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
ACE P12821 2/20 0.33
REN P00797 1/20 0.33
CPB2 Q96IY4 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL676351 0.82 ALDH1A1 (0.44) ALDH1A1KMT2AMEN1MITFEPHX1
SCHEMBL27160173 0.82 EPHX1 (0.39) ALDH1A1KMT2AMEN1MITFSMN1; SMN2
SCHEMBL1226217 0.82 ALDH1A1 (0.44) ALDH1A1KMT2AMEN1SMN1; SMN2EPHX1
SCHEMBL23494790 0.80 ALDH1A1 (0.42) ALDH1A1KMT2AMEN1MITFSMN1; SMN2
SCHEMBL15161783 0.80 ALDH1A1 (0.38) ALDH1A1KMT2AMEN1MITFSMN1; SMN2
SCHEMBL6566358 0.80 GABRP (0.45) ALDH1A1KMT2AMEN1ACEREN
SCHEMBL27488386 0.78 GABRR1 (0.43) ALDH1A1SMN1; SMN2EPHX1CA12CA1
SCHEMBL8054425 0.76 ALDH1A1 (0.37) ALDH1A1KMT2AMEN1MITFSMN1; SMN2
SCHEMBL6567540 0.76 ALDH1A1 (0.36) ALDH1A1KMT2ASMN1; SMN2EPHX1CA12
SCHEMBL27488749 0.76 GABRR1 (0.45) ALDH1A1SMN1; SMN2EPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070196765-A1 RADIATION-SENSITIVE POSITIVE RESIN COMPOSITION FOR PRODUCING PLATINGS, TRANSFER FILM, AND PROCESS FOR PRODUCING PLATINGS JSR CORPORATION (JP) 2007-08-23 US disclosed
US-20070031758-A1 Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material JSR CORPORATION (JP) 2007-02-08 US disclosed