SCHEMBL676431

SCHEMBL676431

C=C[SiH2]OCc1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.46
IDO1 P14902 2/20 0.43
AGXT P21549 1/20 0.41
ALDH1A1 P00352 4/20 0.37
ALOX15 P16050 1/20 0.37
CA1 P00915 3/20 0.36
CA2 P00918 3/20 0.36
CA9 Q16790 3/20 0.36
SLC6A2 P23975 2/20 0.36
SLC6A3 Q01959 2/20 0.36
LMNA P02545 1/20 0.36
CYP1A2 P05177 1/20 0.36
PTGS1 P23219 1/20 0.36
CYP2C19 P33261 1/20 0.36
PTGS2 P35354 1/20 0.36
HIF1A Q16665 1/20 0.36
HDAC6 Q9UBN7 1/20 0.36
CA7 P43166 1/20 0.36
HCAR2 Q8TDS4 1/20 0.36
MAOB P27338 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22654304 0.83 TSHR (0.48) TSHRIDO1AGXTALDH1A1CA1
SCHEMBL22654226 0.80 TSHR (0.45) TSHRCA1CA2CA9CA7
SCHEMBL28481426 0.76 IDO1 (0.50) IDO1LMNAMAOBKMT2A
SCHEMBL675837 0.75 IDO1 (0.45) TSHRIDO1AGXTALDH1A1ALOX15
SCHEMBL28472243 0.75 TSHR (0.43) TSHRIDO1AGXTALDH1A1CA1
SCHEMBL18297943 0.74 TSHR (0.57) TSHRIDO1AGXTALDH1A1CA1
SCHEMBL15848468 0.72 TSHR (0.45) TSHRIDO1AGXTALDH1A1ALOX15
SCHEMBL22654136 0.71 MEN1 (0.39) IDO1CA1CA2CA9HCAR2
Biphenyl SCHEMBL3673774 0.71 NPSR1 (0.36) TSHRIDO1AGXTALDH1A1MAPK1
SCHEMBL20241506 0.71 TSHR (0.54) TSHRIDO1AGXTALDH1A1ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111978481-A Alkali-free water reducing agent and preparation method thereof 东莞创利科技发展有限公司 2020-11-24 CN disclosed
CN-104955900-B Curable composition containing polysiloxane and cured product thereof 中央硝子株式会社 2017-03-15 CN disclosed
US-9512272-B2 Curable composition containing silicone, and cured product thereof CENTRAL GLASS COMPANY, LIMITED (JP) 2016-12-06 US disclosed
US-20150322211-A1 Curable Composition Containing Silicone, and Cured Product Thereof CENTRAL GLASS COMPANY, LIMITED (JP) 2015-11-12 US disclosed
CN-104955900-A Curable composition containing polysiloxane and cured product thereof CENTRAL GLASS CO LTD 2015-09-30 CN disclosed
EP-1746132-B1 SILICON-CONTAINING CURABLE COMPOSITION AND CURED OBJECT OBTAINED BY THERMALLY CURING THE SAME ADEKA CORP (JP) 2013-07-10 EP disclosed
EP-1801871-B1 SEMICONDUCTOR DEVICE KANSAI ELECTRIC POWER CO (JP) 2012-07-11 EP disclosed
CN-1837221-B Production processes for triorganomonochlorosilanes HOKKO CHEM IND CO 2011-06-08 CN disclosed
US-7939614-B2 Silicon-containing curing composition and heat cured product thereof ADEKA CORPORATION (JP) 2011-05-10 US disclosed
US-7772594-B2 covered with a synthetic high molecular compound which is a silicon-containing curable polymer composition having excellent heat resistance and flexibility; high voltage; fluorine-free; platinum curing catalyst THE KANSAI ELECTRIC POWER CO., INC. (JP) 2010-08-10 US disclosed
US-20080210948-A1 High-Heat-Resistive Semiconductor Device THE KANSAI ELECTRIC POWER CO., INC. (JP) 2008-09-04 US disclosed
US-20080174016-A1 Flexible Printed Wiring Board and Semiconductor Device MITSUI MINING & SMELTING CO., LTD. (JP) 2008-07-24 US disclosed
US-20070197755-A1 Silicon-containing curing composition and heat cured product thereof ADEKA CORPORATION (JP) 2007-08-23 US disclosed
EP-1801871-A1 SEMICONDUCTOR DEVICE THE KANSAI ELECTRIC POWER CO., INC. (JP) 2007-06-27 EP disclosed
EP-1746132-A1 SILICON-CONTAINING CURABLE COMPOSITION AND CURED OBJECT OBTAINED BY THERMALLY CURING THE SAME Adeka Corporation (JP) 2007-01-24 EP disclosed
CN-1296374-C Method for producing triorgano-monoalkoxysilanes and method for producing triorgano-monochlorosilanes HOKKO CHEM IND CO (JP) 2007-01-24 CN disclosed
CN-1837221-A Production processes for triorganomonochlorosilanes HOKKO CHEM IND CO (JP) 2006-09-27 CN disclosed
CN-1612886-A Method for producing triorgano-monoalkoxysilanes and method for producing triorgano-monochlorosilanes HOKKO CHEM IND CO (JP) 2005-05-04 CN disclosed