Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | GAA | P10253 | 2/20 | 0.40 |
| ▸ | HTR2C | P28335 | 1/20 | 0.38 |
| ▸ | TLR8 | Q9NR97 | 1/20 | 0.37 |
| ▸ | PDE5A | O76074 | 1/20 | 0.35 |
| ▸ | PDE4A | P27815 | 1/20 | 0.35 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.35 |
| ▸ | PDE4C | Q08493 | 1/20 | 0.35 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.35 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.33 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.33 |
| ▸ | RELA | Q04206 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | GPR55 | Q9Y2T6 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | KDM1A | O60341 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21708113 | 0.81 | HTR2C (0.41) | ALDH1A1GAAHTR2CTLR8PDE5A | |
| SCHEMBL15474650 | 0.80 | CYP3A4 (0.36) | ALDH1A1GAATLR8MAPTMEN1 | |
| SCHEMBL3207844 | 0.80 | ALDH1A1 (0.42) | ALDH1A1GAAHTR2CTLR8PDE5A | |
| SCHEMBL677455 | 0.79 | HTT (0.46) | ALDH1A1TLR8MAPTSMN1; SMN2POLB | |
| SCHEMBL7937245 | 0.76 | ALDH1A1 (0.39) | ALDH1A1GAAHTR2CTLR8NFKB1 | |
| SCHEMBL8388913 | 0.76 | MAPT (0.35) | ALDH1A1PDE5APDE4APDE4BPDE4C | |
| SCHEMBL27567066 | 0.76 | ALDH1A1 (0.36) | ALDH1A1GAAHTR2CTLR8 | |
| SCHEMBL4334443 | 0.75 | ALDH1A1 (0.55) | ALDH1A1GAAHTR2CTLR8PDE5A | |
| SCHEMBL27916430 | 0.75 | DHODH (0.38) | ALDH1A1HTR2CNFKB1NFKB2RELA | |
| SCHEMBL285182 | 0.75 | ALDH1A1 (0.45) | ALDH1A1GAAMAPTMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114206886-B | Gold (III) compound, method for preparing the same, and organic light emitting device using the same | 广东聚华印刷显示技术有限公司 | 2024-02-27 | — | — | CN | claimed |
| CN-114206886-A | Luminescent gold (III) compound, method for preparing same, and organic light emitting device using same | 广东聚华印刷显示技术有限公司 | 2022-03-18 | — | — | CN | claimed |
| WO-2021016814-A1 | LUMINESCENT GOLD (III) COMPOUND, METHOD FOR PREPARING THE SAME, AND ORGANIC LIGHT-EMITTING DEVICE USING THE SAME | GUANGDONG JUHUA PRINTED DISPLAY TECHNOLOGY CO., LTD. (CN) | 2021-02-04 | — | — | WO | claimed |
| CN-114206886-B | Gold (III) compound, method for preparing the same, and organic light emitting device using the same | 广东聚华印刷显示技术有限公司 | 2024-02-27 | — | — | CN | disclosed |
| WO-2021016814-A1 | LUMINESCENT GOLD (III) COMPOUND, METHOD FOR PREPARING THE SAME, AND ORGANIC LIGHT-EMITTING DEVICE USING THE SAME | GUANGDONG JUHUA PRINTED DISPLAY TECHNOLOGY CO., LTD. (CN) | 2021-02-04 | — | — | WO | disclosed |
| US-9235117-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-01-12 | — | — | US | disclosed |
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| EP-2864839-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM Corporation (JP) | 2015-04-29 | — | — | EP | disclosed |
| US-20150079508-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-03-19 | — | — | US | disclosed |
| CN-104335119-A | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device | FUJIFILM CORP | 2015-02-04 | — | — | CN | disclosed |
| WO-2013176294-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-11-28 | — | — | WO | disclosed |
| US-6727033-B2 | A POSITIVE RESIST COMPOSITION COMPRISING A RESIN (A), WHICH IS DECOMPOSED BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPING SOLUTION, CONTAINING A STRUCTURAL UNIT INCLUDING A GROUP REPRESENTED BY FORMULA (X) DEFINED IN | FUJI PHOTO FILM CO., LTD. (JP) | 2004-04-27 | — | — | US | disclosed |
| US-6692883-B2 | GENERATING ACID; ADJUSTMENT SOLUBILITY IN ALKLAINE DEVELOPER | FUJI PHOTO FILM CO., LTD. (JP) | 2004-02-17 | — | — | US | disclosed |
| EP-1367439-A1 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-12-03 | — | — | EP | disclosed |
| US-6630280-B1 | Resin and compound that generates an arylsulfonic acid when exposed to actinic radiation; sensitivity; resolution; smoothness | FUJI PHOTO FILM CO., LTD. (JP) | 2003-10-07 | — | — | US | disclosed |
| US-20030134221-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-07-17 | — | — | US | disclosed |
| US-20020012866-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| US-6242449-B1 | TREATING PROSTATIC HYPERTROPHY, URINATION DISORDERS ASSOCIATED WITH PROSTATIC HYPERTROPHY, MALE PATTERN ALOPECIA, OR ACNE | ZERIA PHARMACEUTICAL CO., LTD. (JP) | 2001-06-05 | — | — | US | disclosed |
| US-6207343-B1 | RESIN CONTAINING GROUPS WHICH DECOMPOSE BY THE ACTION OF AN ACID TO ENHANCE ITS SOLUBILITY IN AN ALKALINE DEVELOPING SOLUTION AND A COMPOUND WHICH GENERATES AN ACID UPON IRRADIATION WITH ACTINIC RAYS OR RADIATION | FUJI PHOTO FILM CO., LTD. (JP) | 2001-03-27 | — | — | US | disclosed |
| EP-0997457-A1 | 3-BENZOYLINDOLE DERIVATIVES AND DRUGS CONTAINING THE SAME | ZERIA PHARMACEUTICAL CO., LTD. (JP) | 2000-05-03 | — | — | EP | disclosed |