⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19405639 | 0.80 | TAAR1 (0.33) | — | |
| SCHEMBL14910504 | 0.80 | — | — | |
| SCHEMBL9431970 | 0.78 | SHBG (0.34) | — | |
| SCHEMBL19405638 | 0.78 | — | — | |
| SCHEMBL19405592 | 0.78 | RIPK1 (0.36) | — | |
| SCHEMBL19405588 | 0.78 | — | — | |
| SCHEMBL19405621 | 0.78 | RIPK1 (0.32) | — | |
| SCHEMBL19405618 | 0.78 | — | — | |
| SCHEMBL9431976 | 0.77 | CNR2 (0.36) | — | |
| SCHEMBL779788 | 0.73 | MAPK1 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8183311-B2 | Liquid phosphite composition derived from cresols | CHEMTURA CORPORATION (US) | 2012-05-22 | — | — | US | claimed |
| US-8008385-B2 | Solid alkylaryl phosphite compositions and methods for manufacturing same | CHEMTURA CORPORATION (US) | 2011-08-30 | — | — | US | claimed |
| US-5028516-A | Method of forming an image comprising rapidly developing an infrared sensitized photographic material comprising surfactants | FUJI PHOTO FILM CO., LTD. (JP) | 1991-07-02 | — | — | US | claimed |
| CN-104335119-B | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, the manufacturing method of electronic device and electronic device | 富士胶片株式会社 | 2018-10-09 | — | — | CN | disclosed |
| US-9249090-B2 | N-substituted carbamic acid ester production method and isocyanate production method using the N-substituted carbamic acid ester | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2016-02-02 | — | — | US | disclosed |
| US-9235117-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-01-12 | — | — | US | disclosed |
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| EP-2864839-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM Corporation (JP) | 2015-04-29 | — | — | EP | disclosed |
| US-20150079508-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-03-19 | — | — | US | disclosed |
| US-20150038742-A1 | N-Substituted Carbamic Acid Ester Production Method and Isocyanate Production Method Using the N-Substituted Carbamic Acid Ester | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2015-02-05 | — | — | US | disclosed |
| CN-104335119-A | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device | FUJIFILM CORP | 2015-02-04 | — | — | CN | disclosed |
| US-20030108811-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-06-12 | — | — | US | disclosed |
| US-20020012866-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| US-6207343-B1 | RESIN CONTAINING GROUPS WHICH DECOMPOSE BY THE ACTION OF AN ACID TO ENHANCE ITS SOLUBILITY IN AN ALKALINE DEVELOPING SOLUTION AND A COMPOUND WHICH GENERATES AN ACID UPON IRRADIATION WITH ACTINIC RAYS OR RADIATION | FUJI PHOTO FILM CO., LTD. (JP) | 2001-03-27 | — | — | US | disclosed |
| EP-0447964-B1 | Shaped articles of aromatic polyetherketones stabilized against UV radiation and process for preparing them | BASF AG (DE) | 1995-06-21 | — | — | EP | disclosed |
| EP-0447964-A2 | Shaped articles of aromatic polyetherketones stabilized against UV radiation and process for preparing them | BASF Aktiengesellschaft (DE) | 1991-09-25 | — | — | EP | disclosed |
| US-5043256-A | Good color reproduction; nonstaining | FUJI PHOTO FILM CO., LTD. (JP) | 1991-08-27 | — | — | US | disclosed |
| US-5028516-A | Method of forming an image comprising rapidly developing an infrared sensitized photographic material comprising surfactants | FUJI PHOTO FILM CO., LTD. (JP) | 1991-07-02 | — | — | US | disclosed |
| EP-0271005-A2 | Silver halide photographic light-sensitive material excellent in dye-image preservability | KONICA CORPORATION (JP) | 1988-06-15 | — | — | EP | disclosed |
| US-4060541-A | Aromatic cyanic acid esters | BAYER AKTIENGESELLSCHAFT (DT) | 1977-11-29 | — | — | US | disclosed |