SCHEMBL678482

SCHEMBL678482

CC(Cl)c1ccc([N+](=O)[O-])cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 2/20 0.52
ACHE P22303 1/20 0.52
MAPT P10636 4/20 0.52
MAPK1 P28482 2/20 0.52
L3MBTL1 Q9Y468 2/20 0.52
CYP3A4 P08684 2/20 0.52
TSHR P16473 2/20 0.52
CYP1A2 P05177 1/20 0.52
PHLPP2 Q6ZVD8 1/20 0.52
TDP1 Q9NUW8 1/20 0.52
ALDH1A1 P00352 8/20 0.50
KDM4E B2RXH2 2/20 0.50
KMT2A Q03164 2/20 0.47
MEN1 O00255 1/20 0.47
RECQL P46063 1/20 0.47
GAA P10253 1/20 0.45
NPC1 O15118 1/20 0.45
LMNA P02545 2/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
MARS2 Q96GW9 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7195325 0.84 HSD17B10 (0.54) HSD17B10ACHEMAPTMAPK1L3MBTL1
SCHEMBL7017234 0.82 ALDH1A1 (0.52) HSD17B10ACHEMAPTMAPK1L3MBTL1
SCHEMBL254528 0.82 ALDH1A1 (0.56) HSD17B10ACHEMAPTMAPK1L3MBTL1
SCHEMBL11429229 0.82 ALDH1A1 (0.52) HSD17B10ACHEMAPTMAPK1L3MBTL1
SCHEMBL11695567 0.80 HSD17B10 (0.54) HSD17B10ACHEMAPTMAPK1L3MBTL1
SCHEMBL16487923 0.79 MAPT (0.49) HSD17B10ACHEMAPTMAPK1L3MBTL1
SCHEMBL27855209 0.79 HSD17B10 (0.64) HSD17B10ACHEMAPTMAPK1L3MBTL1
SCHEMBL13875028 0.78 HSD17B10 (0.52) HSD17B10ACHEMAPTMAPK1L3MBTL1
SCHEMBL11034574 0.78 ALDH1A1 (0.48) HSD17B10ACHEMAPTMAPK1L3MBTL1
SCHEMBL811522 0.78 ALDH1A1 (0.52) HSD17B10ACHEMAPTMAPK1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110950781-A Novel diamine, polyamic acid, and polyimide 日产化学工业株式会社 2020-04-03 CN disclosed
CN-107428629-A Process for producing alpha-olefin oligomer 三菱化学株式会社 2017-12-01 CN disclosed
EP-1619211-B1 PROCESS FOR PRODUCTION OF LIVING-RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL CO LTD (JP) 2012-10-17 EP disclosed
US-20110275774-A1 ORGANOANTIMONY COMPOUND, PROCESS FOR PREPARING SAME, LIVING RADICAL POLYMERIZATION INITIATOR, PROCESS FOR PRODUCING POLYMER WITH USE OF SAME, AND THE POLYMER YAMAGO SHIGERU 2011-11-10 US disclosed
EP-1595894-B1 PROCESS FOR THE PRODUCTION OF LIVING RADICAL POLYMERS OTSUKA CHEMICAL CO LTD (JP) 2011-10-12 EP disclosed
US-8008414-B2 Organic antimony compound, process for producing the same, living radical polymerization initiator, process for producing polymer using the same, and polymer OTSUKA CHEMICAL CO., LTD. (JP) 2011-08-30 US disclosed
EP-1829883-B1 ORGANIC BISMUTH COMPOUND, METHOD FOR PRODUCING SAME, LIVING RADICAL POLYMERIZATION INITIATOR, METHOD FOR PRODUCING POLYMER USING SAME, AND POLYMER OTSUKA CHEMICAL CO LTD (JP) 2011-08-17 EP disclosed
EP-1767539-B1 ORGANIC ANTIMONY COMPOUND, PROCESS FOR PRODUCING THE SAME, LIVING RADICAL POLYMERIZATION INITIATOR, PROCESS FOR PRODUCING POLYMER USING THE SAME, AND POLYMER OTSUKA CHEMICAL CO LTD (JP) 2011-07-27 EP disclosed
US-7847043-B2 Organic bismuth compound, method for producing same, living radical polymerization initiator, method for producing polymer using same, and polymer OTSUKA CHEMICAL CO., LTD. (JP) 2010-12-07 US disclosed
CN-1820030-B Process for the production of living radical polymers and polymers OTSUKA CHEMICAL CO LTD 2010-10-06 CN disclosed
EP-1619211-A1 PROCESS FOR PRODUCTION OF LIVING-RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL COMPANY, LIMITED (JP) 2006-01-25 EP disclosed
EP-1595894-A1 PROCESS FOR THE PRODUCTION OF LIVING RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL COMPANY, LIMITED (JP) 2005-11-16 EP disclosed
US-20050245714-A1 Organic tellurium compound, process for producing the same, living radical polymerization initiator, process for producing polymer with the same, and polymer OTSUKA CHEMICAL CO., LTD. (JP) 2005-11-03 US disclosed
CN-1675253-A Method for producing living radical polymer and polymer OTSUKA CHEMICAL CO LTD (JP) 2005-09-28 CN disclosed
CN-1649838-A Organic tellurium compound, method for producing same, living radical polymerization initiator, method for producing polymer using same, and polymer OTSUKA KAGAKU KK (JP) 2005-08-03 CN disclosed
EP-1541550-A1 ORGANIC TELLURIUM COMPOUND, PROCESS FOR PRODUCING THE SAME, LIVING RADICAL POLYMERIZATION INITIATOR, PROCESS FOR PRODUCING POLYMER WITH THE SAME, AND POLYMER Otsuka Chemical Co., Ltd. (JP) 2005-06-15 EP disclosed
EP-1541592-A1 PROCESS FOR PRODUCTION OF LIVING RADICAL POLYMERS AND POLYMERS OTSUKA CHEMICAL COMPANY, LIMITED (JP) 2005-06-15 EP disclosed
US-4452878-A A PROTECTIVE COATING OF A CATIONIC POLYVINYPYRIDINE THAT OPACIFIES UPON BASIFICATION; COLOR FILMS POLAROID CORPORATION (US) 1984-06-05 US disclosed
US-4140775-A HYPOTENSIVE AGENTS THE UPJOHN COMPANY (US) 1979-02-20 US disclosed
US-4051168-A TO FORM FLUOROALKYL AROMATIC COMPOUNDS E. I. DU PONT DE NEMOURS AND COMPANY (US) 1977-09-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050245714-A1 Organic tellurium compound, process for producing the same, living radical polymerization initiator, process for producing polymer with the same, and polymer ODC1, TERB1, TTI1 HSD17B10 801/4885ACHE 371/4885MAPT 1588/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.