Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | TSHR | P16473 | 3/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1067047 | 0.92 | ALDH1A1 (0.44) | ALDH1A1TSHRTHRBGAA | |
| SCHEMBL10049774 | 0.86 | ALDH1A1 (0.39) | ALDH1A1TSHRTHRBGAA | |
| SCHEMBL7706303 | 0.83 | ALDH1A1 (0.41) | ALDH1A1TSHRTHRBGAA | |
| SCHEMBL7701340 | 0.83 | ALDH1A1 (0.41) | ALDH1A1TSHRTHRBGAA | |
| SCHEMBL7706289 | 0.82 | TSHR (0.41) | ALDH1A1TSHRTHRBGAA | |
| SCHEMBL6924019 | 0.82 | ALDH1A1 (0.39) | ALDH1A1TSHRTHRBGAA | |
| SCHEMBL441489 | 0.82 | TSHR (0.41) | ALDH1A1TSHRTHRBGAA | |
| SCHEMBL2765947 | 0.82 | ALDH1A1 (0.39) | ALDH1A1TSHRTHRBGAA | |
| SCHEMBL7701376 | 0.82 | TSHR (0.41) | ALDH1A1TSHRTHRBGAA | |
| SCHEMBL7709308 | 0.82 | TSHR (0.41) | ALDH1A1TSHRTHRBGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 196 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2186838-B1 | METHOD FOR PRODUCING STAR POLYMER | NIPPON SODA CO (JP) | 2014-08-27 | — | — | EP | claimed |
| US-20100210805-A1 | METHOD FOR PRODUCING STAR POLYMER | NIPPON SODA CO., LTD. (JP) | 2010-08-19 | — | — | US | claimed |
| EP-2186838-A1 | METHOD FOR PRODUCING STAR POLYMER | Nippon Soda Co., Ltd. (JP) | 2010-05-19 | — | — | EP | claimed |
| EP-1011029-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2006-08-30 | — | — | EP | claimed |
| US-6337171-B1 | AS A RESIST APPLICABLE TO FAR ULTRAVIOLET RAYS SUCH AS A KRF EXCIMER LASER, CHARGED PARTICLE RAYS SUCH AS ELECTRON BEAMS, AND X-RAYS | JSR CORPORATION (JP) | 2002-01-08 | — | — | US | claimed |
| EP-1011029-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2000-06-21 | — | — | EP | claimed |
| EP-4400223-A1 | DIGITAL EMBOSSING CREATION METHOD | Sakata INX Corporation (JP) | 2024-07-17 | — | — | EP | disclosed |
| EP-4397726-A1 | PHOTOCURABLE INK COMPOSITION FOR INKJET PRINTING | Sakata INX Corporation (JP) | 2024-07-10 | — | — | EP | disclosed |
| US-20240218195-A1 | ELECTRON BEAM-CURABLE PRINTING INK COMPOSITION AND PRINTED MATTER OBTAINED BY PRINTING WITH ELECTRON BEAM-CURABLE PRINTING INK COMPOSITION | SAKATA INX CORPORATION (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240158652-A1 | ACTINIC-RAY-CURABLE INK COMPOSITION AND PRODUCTION METHOD THEREFOR | SAKATA INX CORPORATION (JP) | 2024-05-16 | — | — | US | disclosed |
| EP-4364950-A1 | ACTINIC RAY-CURABLE INKJET INK COMPOSITION | Sakata INX Corporation (JP) | 2024-05-08 | — | — | EP | disclosed |
| US-20240132734-A1 | ACTIVE ENERGY RAY-CURABLE OFFSET PRINTING INK COMPOSITION | SAKATA INX CORP (JP) | 2024-04-25 | — | — | US | disclosed |
| WO-2024075386-A1 | ACTIVE ENERGY RAY-CURABLE INK COMPOSITION FOR SURFACE PRINTING | サカタインクス株式会社 | 2024-04-11 | — | — | WO | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| US-6280900-B1 | RADIATION SENSITIVE COMPOSITION WITH ALKALINE DEVELOPER SOLUBLE IN POLYMER COATED ON SUBSTRATE | JSR CORPORATION (JP) | 2001-08-28 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |
| EP-1035436-A1 | Resist pattern formation method | JSR Corporation (JP) | 2000-09-13 | — | — | EP | disclosed |
| EP-1011029-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2000-06-21 | — | — | EP | disclosed |