Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.62 |
| ▸ | TSHR | P16473 | 5/20 | 0.48 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.41 |
| ▸ | THRB | P10828 | 2/20 | 0.41 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | FGFR4 | P22455 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.32 |
| ▸ | EGLN3 | Q9H6Z9 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 2/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.30 |
| ▸ | BLM | P54132 | 2/20 | 0.30 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Adamantane SCHEMBL30013496 | 1.00 | LMNA (0.62) | LMNATSHRCYP2C9THRBHSD11B1 | |
| Adamantane SCHEMBL18258577 | 0.89 | LMNA (0.50) | LMNATSHRCYP2C9THRBHSD11B1 | |
| Acrylic Acid SCHEMBL7036982 | 0.88 | LMNA (0.56) | LMNATSHRCYP2C9THRBHSD11B1 | |
| Acrylic Acid SCHEMBL27826440 | 0.88 | LMNA (0.56) | LMNATSHRCYP2C9THRBHSD11B1 | |
| Adamantan-2-Ol SCHEMBL28007882 | 0.85 | CYP2C9 (0.59) | LMNATSHRCYP2C9THRBHSD11B1 | |
| Acrylic Acid SCHEMBL3286550 | 0.84 | LMNA (0.50) | LMNATSHRCYP2C9THRBALOX15 | |
| Acrylic Acid SCHEMBL7917031 | 0.79 | — | — | |
| Acrylic Acid SCHEMBL10399973 | 0.79 | — | — | |
| Acrylic Acid SCHEMBL5065665 | 0.79 | LMNA (1.00) | LMNATSHRALOX15HSD17B10ALDH1A1 | |
| Acrylic Acid SCHEMBL11652408 | 0.79 | LMNA (1.00) | LMNATSHRALOX15HSD17B10ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 176 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117946592-A | Low-dielectric-constant organic barrier layer photo-curing adhesive and use method and application thereof | 西安思摩威新材料有限公司 | 2024-04-30 | — | — | CN | claimed |
| CN-116913593-B | Anti-drag high-flexibility cable and preparation method thereof | 天津小猫天缆集团有限公司 | 2023-11-14 | — | — | CN | claimed |
| CN-116913593-A | Anti-drag high-flexibility cable and preparation method thereof | 天津小猫天缆集团有限公司 | 2023-10-20 | — | — | CN | claimed |
| CN-114957756-A | Preparation method of manganese-doped red-light perovskite quantum dot optical film with stable performance | 阳明量子科技(深圳)有限公司 | 2022-08-30 | — | — | CN | claimed |
| CN-114958154-A | Preparation method of green-light perovskite quantum dot optical film | 阳明量子科技(深圳)有限公司 | 2022-08-30 | — | — | CN | claimed |
| CN-114874765-A | Preparation method of red-light perovskite quantum dot film | 阳明量子科技(深圳)有限公司 | 2022-08-09 | — | — | CN | claimed |
| CN-113321912-B | High-temperature-resistant 3D printing photosensitive resin and preparation method and application thereof | 广东工业大学 | 2022-07-12 | — | — | CN | claimed |
| CN-112679653-B | Photoresist film-forming resin and preparation method of photoresist composition thereof | 甘肃华隆芯材料科技有限公司 | 2021-09-14 | — | — | CN | claimed |
| CN-113321912-A | High-temperature-resistant 3D printing photosensitive resin and preparation method and application thereof | 广东工业大学 | 2021-08-31 | — | — | CN | claimed |
| CN-113150222-A | Fast-curing friction-resistant epoxy acrylic resin and preparation method thereof | 中科院广州化学有限公司 | 2021-07-23 | — | — | CN | claimed |
| CN-109966782-B | Polyacrylate/hydrophobic silica composite high oil absorption material | 应急管理部上海消防研究所 | 2021-06-15 | — | — | CN | claimed |
| CN-112679653-A | Photoresist film-forming resin and preparation method of photoresist composition thereof | 甘肃华隆芯材料科技有限公司 | 2021-04-20 | — | — | CN | claimed |
| CN-109966782-A | A kind of compound high oil-absorbent material of polyacrylate/hydrophobic silica | 应急管理部上海消防研究所 | 2019-07-05 | — | — | CN | claimed |
| EP-0869998-B1 | RADIATION-HARDENABLE COATINGS | BASF AG (DE) | 2002-05-08 | — | — | EP | claimed |
| US-6106905-A | POLYMERS OF ACRYLIC ACID, ESTERS, AMIDES WITH METHANOINDENE DERIVATIVES FOR POWDER COATINGS | BASF LACKE + FARBEN AKTIENGESELLSCHAFT (DE) | 2000-08-22 | — | — | US | claimed |
| CN-122055647-A | Antireflection film, polarizing plate, and optical member | 凸版巴川光学薄膜株式会社 | 2026-05-15 | — | — | CN | disclosed |
| CN-121679980-A | ArF photoresist composition and method for forming photoetching pattern | 宁波南大光电材料有限公司 | 2026-03-17 | — | — | CN | disclosed |
| EP-0060015-A1 | Polysiloxane with cycloalkyl modifier composition and biomedical devices | BAUSCH & LOMB INCORPORATED (US) | 1982-09-15 | — | — | EP | disclosed |
| EP-0059528-A1 | Polysiloxane with polycyclic modifier composition and biomedical devices | BAUSCH & LOMB INCORPORATED (US) | 1982-09-08 | — | — | EP | disclosed |
| US-4327203-A | Polysiloxane with cycloalkyl modifier composition and biomedical devices | BAUSCH & LOMB INCORPORATED (US) | 1982-04-27 | — | — | US | disclosed |