Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL7036982 | 0.95 | LMNA (0.56) | LMNATSHRTHRBCYP2C9ALOX15 | |
| Adamantane SCHEMBL30013496 | 0.84 | LMNA (0.62) | LMNATSHRTHRBCYP2C9ALOX15 | |
| Adamantane SCHEMBL679263 | 0.84 | LMNA (0.62) | LMNATSHRTHRBCYP2C9ALOX15 | |
| Acrylic Acid SCHEMBL2481347 | 0.78 | — | — | |
| Fumaric Acid SCHEMBL28755166 | 0.76 | THRB (0.56) | LMNATSHRTHRBCYP2C9ATM | |
| Adamantane SCHEMBL18258577 | 0.75 | LMNA (0.50) | LMNATSHRTHRBCYP2C9ALOX15 | |
| Acrylic Acid SCHEMBL28926860 | 0.74 | — | — | |
| Acrylic Acid SCHEMBL28595023 | 0.74 | LMNA (0.77) | LMNATSHRALOX15HSD17B10 | |
| Bicarbonate SCHEMBL14480226 | 0.74 | CA1 (0.39) | LMNATSHRTHRBCYP2C9ALOX15 | |
| Acrylic Acid SCHEMBL27826440 | 0.74 | LMNA (0.56) | LMNATSHRTHRBCYP2C9ALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7709179-B2 | Negative resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-05-04 | — | — | US | disclosed |
| US-20090035697-A1 | NEGATIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKAKOGYO CO.,LTD. (JP) | 2009-02-05 | — | — | US | disclosed |