SCHEMBL679295

SCHEMBL679295

CCCCCCCCCCCCCC(F)(F)S(=O)(=O)O

nearest known ligand 0.48

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
CES2 O00748 4/20 0.48
LPAR1 Q92633 1/20 0.48
LPAR3 Q9UBY5 1/20 0.48
EPHX1 P07099 2/20 0.47
GGPS1 O95749 1/20 0.47
CES1 P23141 9/20 0.43
FAAH O00519 9/20 0.43
MEN1 O00255 1/20 0.42
CYP1A2 P05177 1/20 0.42
KMT2A Q03164 1/20 0.42
HSD17B10 Q99714 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3871219 1.00 CES2 (0.48) CES2LPAR1LPAR3EPHX1GGPS1
SCHEMBL18008526 1.00 CES2 (0.48) CES2LPAR1LPAR3EPHX1GGPS1
SCHEMBL18008245 1.00 CES2 (0.48) CES2LPAR1LPAR3EPHX1GGPS1
SCHEMBL18007779 1.00 CES2 (0.48) CES2LPAR1LPAR3EPHX1GGPS1
SCHEMBL17773374 1.00 CES2 (0.48) CES2LPAR1LPAR3EPHX1GGPS1
SCHEMBL18008423 1.00 CES2 (0.48) CES2LPAR1LPAR3EPHX1GGPS1
SCHEMBL18008469 1.00 CES2 (0.48) CES2LPAR1LPAR3EPHX1GGPS1
Ammonia Solution, Strong SCHEMBL18008607 0.98 CES2 (0.47) CES2LPAR1LPAR3EPHX1GGPS1
Ammonia Solution, Strong SCHEMBL18008554 0.98 CES2 (0.47) CES2LPAR1LPAR3EPHX1GGPS1
Ammonia Solution, Strong SCHEMBL18009026 0.98 CES2 (0.47) CES2LPAR1LPAR3EPHX1GGPS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114075125-A Long-chain alkyl fluorine-containing sulfonate ionic membrane compound for blocking water permeation of lithium-air battery 上海漫关越水处理有限公司 2022-02-22 CN disclosed
US-10025188-B2 Resist pattern-forming method JSR CORPORATION (JP) 2018-07-17 US disclosed
US-20170322492-A1 RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2017-11-09 US disclosed
US-20160320705-A1 RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2016-11-03 US disclosed
US-9348226-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2016-05-24 US disclosed
US-9329478-B2 Polysiloxane composition and pattern-forming method JSR CORPORATION (JP) 2016-05-03 US disclosed
US-20160097978-A1 RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2016-04-07 US disclosed
US-20150160556-A1 RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2015-06-11 US disclosed
US-8993223-B2 Resist pattern-forming method JSR CORPORATION (JP) 2015-03-31 US disclosed
US-20150050600-A9 RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2015-02-19 US disclosed
US-7452655-B2 Acrylic copolymer and radiation-sensitive resin composition JSR CORPORATION (JP) 2008-11-18 US disclosed
US-20070269754-A1 Acrylic Polymer and Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2007-11-22 US disclosed
US-20070265404-A1 Organic Bismuth Compound, Method for Producing Same, Living Radical Polymerization Initiator, Method for Producing Polymer Using Same, and Polymer OTSUKA CHEMICAL CO., LTD. (JP) 2007-11-15 US disclosed
EP-1829883-A1 ORGANIC BISMUTH COMPOUND, METHOD FOR PRODUCING SAME, LIVING RADICAL POLYMERIZATION INITIATOR, METHOD FOR PRODUCING POLYMER USING SAME, AND POLYMER Otsuka Chemical Co., Ltd. (JP) 2007-09-05 EP disclosed
EP-1767539-A1 ORGANIC ANTIMONY COMPOUND, PROCESS FOR PRODUCING THE SAME, LIVING RADICAL POLYMERIZATION INITIATOR, PROCESS FOR PRODUCING POLYMER USING THE SAME, AND POLYMER OTSUKA CHEMICAL COMPANY, LTD. (JP) 2007-03-28 EP disclosed
US-20060234154-A1 Mixture containing acid generator and free radical catalyst; acrylated ester monomer JSR CORPORATION (JP) 2006-10-19 US disclosed
EP-1652866-A1 ACRYLIC POLYMERS AND RADIATION-SENSITIVE RESIN COMPOSITIONS JSR Corporation (JP) 2006-05-03 EP disclosed
US-20060074139-A1 Acrylic copolymer and radiation-sensitive resin composition JSR CORPORATION (JP) 2006-04-06 US disclosed
EP-1602975-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2005-12-07 EP disclosed
EP-1586594-A1 ACRYLIC COPOLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2005-10-19 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070265404-A1 Organic Bismuth Compound, Method for Producing Same, Living Radical Polymerization Initiator, Method for Producing Polymer Using Same, and Polymer DOHH, COASY, ODC1 CES2 408/4885LPAR1 3445/4885LPAR3 3639/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.