SCHEMBL67938

SCHEMBL67938

C=C(C)C(=O)OCCOc1ccc(CCCCCCCCC)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.59
USP2 O75604 1/20 0.59
ALDH1A1 P00352 1/20 0.59
LMNA P02545 1/20 0.59
CYP3A4 P08684 1/20 0.59
MAPK1 P28482 1/20 0.59
CASP1 P29466 1/20 0.59
KMT2A Q03164 1/20 0.59
SMN1; SMN2 Q16637 1/20 0.59
SLCO1B3 Q9NPD5 1/20 0.59
SLCO1B1 Q9Y6L6 1/20 0.59
POLB P06746 1/20 0.58
APEX1 P27695 1/20 0.58
HTT P42858 1/20 0.58
TDP1 Q9NUW8 1/20 0.58
TSHR P16473 2/20 0.56
THRB P10828 3/20 0.56
THRA P10827 2/20 0.56
PLA2G4A P47712 2/20 0.54
S1PR4 O95977 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14477491 0.96 MEN1 (0.66) MEN1USP2ALDH1A1LMNACYP3A4
SCHEMBL68457 0.96 POLB (0.60) MEN1USP2ALDH1A1LMNACYP3A4
SCHEMBL28115017 0.94 POLB (0.57) MEN1USP2ALDH1A1LMNACYP3A4
SCHEMBL28385901 0.93 MEN1 (0.52) MEN1USP2ALDH1A1LMNACYP3A4
SCHEMBL19252417 0.93 MEN1 (0.52) MEN1USP2ALDH1A1LMNACYP3A4
SCHEMBL10033664 0.92 MEN1 (0.61) MEN1USP2ALDH1A1LMNACYP3A4
SCHEMBL68704 0.92 MEN1 (0.61) MEN1USP2ALDH1A1LMNACYP3A4
SCHEMBL8006616 0.90 POLB (0.59) ALDH1A1LMNAPOLBAPEX1HTT
SCHEMBL10029272 0.90 POLB (0.58) MEN1USP2ALDH1A1LMNACYP3A4
SCHEMBL25402465 0.90 POLB (0.61) MEN1USP2ALDH1A1LMNACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 200 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20060105126-A1 Heat sealable antifog film materials E. I. DU PONT DE NEMOURS AND COMPANY 2006-05-18 US claimed
EP-1108534-B1 Polymer system and its use in direct exposure printing plates CREO S R L (IN) 2005-08-24 EP claimed
US-20030162129-A1 Polymer system with switchable physical properties and its use in direct exposure printing plates CREO SRL 2003-08-28 US claimed
US-6503691-B1 Crosslinkable polymer and metal salt of sulfamide derivatives CREO SRL (BB) 2003-01-07 US claimed
EP-1108534-A1 Polymer system and its use in direct exposure printing plates Creo S.r.l. (IN) 2001-06-20 EP claimed
US-6120968-A LIGHT SENSITIVE RECORDING MEDIA AND REFLECTANCE BROTHER KOGYO KABUSHIKI KAISHA (JP) 2000-09-19 US claimed
US-6117609-A MICROCAPSULES COMPRISE A PHOTOPOLYMERIZABLE UNSATURATED COMPOUND AND A PHOSPHITE HAVING AT LEAST ONE THIO LINKAGE; COLORANT AS A PHOTOSENSITIZER; HARDENING USING LOW ENERGY; ANTISOILANTS BROTHER KOGYO KABUSHIKI KAISHA (JP) 2000-09-12 US claimed
US-6025112-A COMPOSITION HIGHLY SENSITIVE TO NEAR INFRARED RADIATION AND VISIBLE LIGHT HAVING SPECIFIED WAVELENGTH, COMPRISING UNSATURATED COMPOUND BASE MATERIAL, METAL ARENE PHOTOPOLYMERIZATION INITIATOR, ANILINE COMPOUND BROTHER KOGYO KABUSHIKI KAISHA (JP) 2000-02-15 US claimed
US-5955237-A CATIONIC CYANINE DYE SENSITIZER; CATHODE RAY TUBES; LIGHT EMITTING DEVICES BROTHER KOGYO KABUSHIKI KAISHA (JP) 1999-09-21 US claimed
EP-0884650-A1 Photosensitive recording material using microcapsules Brother Kogyo Kabushiki Kaisha (JP) 1998-12-16 EP claimed
EP-3018118-B1 BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2023-07-05 EP disclosed
CN-112968108-B Transfer method of light-emitting structure 重庆康佳光电技术研究院有限公司 2022-07-29 CN disclosed
CN-112968108-A Transfer method of light-emitting structure 重庆康佳光电技术研究院有限公司 2021-06-15 CN disclosed
CN-107300831-B Curable composition applied to LED photocuring 常州强力电子新材料股份有限公司 2021-01-15 CN disclosed
CN-107848963-B Acid-resistant alkali-producing agent and/or radical-producing agent, and curable resin composition containing same 富士胶片和光纯药株式会社 2020-11-03 CN disclosed
US-6025112-A COMPOSITION HIGHLY SENSITIVE TO NEAR INFRARED RADIATION AND VISIBLE LIGHT HAVING SPECIFIED WAVELENGTH, COMPRISING UNSATURATED COMPOUND BASE MATERIAL, METAL ARENE PHOTOPOLYMERIZATION INITIATOR, ANILINE COMPOUND BROTHER KOGYO KABUSHIKI KAISHA (JP) 2000-02-15 US disclosed
US-5955237-A CATIONIC CYANINE DYE SENSITIZER; CATHODE RAY TUBES; LIGHT EMITTING DEVICES BROTHER KOGYO KABUSHIKI KAISHA (JP) 1999-09-21 US disclosed
EP-0924569-A1 Fast-curing photosensitive composition and recording sheet Brother Kogyo Kabushiki Kaisha (JP) 1999-06-23 EP disclosed
EP-0884650-A1 Photosensitive recording material using microcapsules Brother Kogyo Kabushiki Kaisha (JP) 1998-12-16 EP disclosed
US-4789620-A CROSSLINKED, CURED COATING MITSUBISHI RAYON CO. LTD. (JP) 1988-12-06 US disclosed