Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.55 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.53 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.53 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.53 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.53 |
| ▸ | ABL1 | P00519 | 1/20 | 0.52 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.52 |
| ▸ | BCR | P11274 | 1/20 | 0.52 |
| ▸ | CA12 | O43570 | 1/20 | 0.48 |
| ▸ | CA1 | P00915 | 1/20 | 0.48 |
| ▸ | CA2 | P00918 | 1/20 | 0.48 |
| ▸ | CA7 | P43166 | 1/20 | 0.48 |
| ▸ | CA9 | Q16790 | 1/20 | 0.48 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.48 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | GFER | P55789 | 1/20 | 0.46 |
| ▸ | ACHE | P22303 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10068337 | 0.92 | ACHE (0.54) | SMN1; SMN2CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL22073083 | 0.89 | DYRK1A (0.52) | SMN1; SMN2CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL14301863 | 0.88 | MEN1 (0.52) | SMN1; SMN2CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL14457620 | 0.88 | TDP1 (0.54) | SMN1; SMN2CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL13614276 | 0.88 | SMN1; SMN2 (0.48) | SMN1; SMN2CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL24767596 | 0.88 | CYP1A1 (0.48) | SMN1; SMN2CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL29083061 | 0.88 | ESR2 (0.59) | SMN1; SMN2CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL7822185 | 0.88 | ESR2 (0.55) | SMN1; SMN2CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL12345146 | 0.88 | ACHE (0.54) | SMN1; SMN2CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL12326180 | 0.86 | CA1 (0.50) | CYP1A2CYP2D6CYP2C9CYP2C19KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 88 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0365359-A2 | A method for forming a colored image on a degradable sheet material | HOECHST CELANESE CORPORATION (US) | 1990-04-25 | — | — | EP | claimed |
| JP-10310634-A | — | — | None | — | — | JP | disclosed |
| JP-5117350-A | — | — | None | — | — | JP | disclosed |
| CN-113960879-B | Hard mask composition, preparation method thereof and method for forming patterns | 厦门恒坤新材料科技股份有限公司 | 2024-05-24 | — | — | CN | disclosed |
| WO-2024071047-A1 | POLYFUNCTIONAL VINYL RESIN, AND PRODUCTION METHOD, COMPOSITION, AND CURED PRODUCT OF SAME | 日鉄ケミカル＆マテリアル株式会社 | 2024-04-04 | — | — | WO | disclosed |
| WO-2024029602-A1 | RESIN COMPOSITION, AND CURED PRODUCT | 日鉄ケミカル＆マテリアル株式会社 | 2024-02-08 | — | — | WO | disclosed |
| CN-117460756-A | Epoxy resin, epoxy resin composition and cured product thereof | 日铁化学材料株式会社 | 2024-01-26 | — | — | CN | disclosed |
| CN-111819242-B | Epoxy resin composition, cured product thereof, and semiconductor device | 日铁化学材料株式会社 | 2023-09-26 | — | — | CN | disclosed |
| WO-2023063122-A1 | CURABLE RESIN COMPOSITION, PREPREG, AND CURED PRODUCT OF SAME | 日本化薬株式会社 | 2023-04-20 | — | — | WO | disclosed |
| WO-2023013092-A1 | EPOXY RESIN MIXTURE, EPOXY RESIN COMPOSITION AND CURED PRODUCT OF SAME | 日本化薬株式会社 | 2023-02-09 | — | — | WO | disclosed |
| JP-H10310634-A | PRODUCTION OF PHENOL NOVOLAC CONDENSATE | MEIWA KASEI KK | 1998-11-24 | — | — | JP | disclosed |
| EP-0752430-A2 | Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates | SUN CHEMICAL CORPORATION (US) | 1997-01-08 | — | — | EP | disclosed |
| EP-0749045-A2 | Photosensitive compositions and their use in lithographic plates | SUN CHEMICAL CORPORATION (US) | 1996-12-18 | — | — | EP | disclosed |
| JP-H05117350-A | NEW PHENOLIC COMPOUND, ITS EPOXIDIZED SUBSTANCE AND THEIR PRODUCTION | NIPPON STEEL CHEM CO LTD | 1993-05-14 | — | — | JP | disclosed |
| EP-0212482-B1 | PROCESS FOR OBTAINING NEGATIVE IMAGES FROM POSITIVE PHOTORESISTS | HOECHST CELANESE CORPORATION (US) | 1989-04-19 | — | — | EP | disclosed |
| EP-0212482-A2 | Process for obtaining negative images from positive photoresists | HOECHST CELANESE CORPORATION (US) | 1987-03-04 | — | — | EP | disclosed |
| US-4248976-A | COMPRISING A PHOSPHORUS COMPOUND AND AN AROMATIC COMPOUND | CIBA-GEIGY AG (CH) | 1981-02-03 | — | — | US | disclosed |
| US-4172858-A | Flame-resistant polymer compositions | CIBA-GEIGY AG (CH) | 1979-10-30 | — | — | US | disclosed |
| US-4163731-A | HYDRAULIC FLUIDS | CIBA-GEIGY AG (CH) | 1979-08-07 | — | — | US | disclosed |
| US-4021243-A | Diazo light-sensitive copying composition and process of using in the manufacture of screen printing stencils | HOECHST AKTIENGESELLSCHAFT (DT) | 1977-05-03 | — | — | US | disclosed |