SCHEMBL679996

SCHEMBL679996

CCO[Si](CCCCNC(N)=O)(OCC)OCC

nearest known ligand 0.42

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CA12 O43570 1/20 0.38
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
CA9 Q16790 1/20 0.38
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
EPHX1 P07099 6/20 0.36
KDM4E B2RXH2 1/20 0.34
MAPK1 P28482 1/20 0.34
HIF1A Q16665 1/20 0.34
PAOX Q6QHF9 3/20 0.33
NPC1 O15118 1/20 0.33
RAB9A P51151 1/20 0.33
DPP7 Q9UHL4 1/20 0.33
CASP2 P42575 1/20 0.32
ACHE P22303 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3912394 0.98 EPHX1 (0.39) CA12CA1CA2CA9MEN1
SCHEMBL3913343 0.98 EPHX1 (0.39) CA12CA1CA2CA9MEN1
SCHEMBL3912395 0.98 EPHX1 (0.39) CA12CA1CA2CA9MEN1
SCHEMBL1142988 0.98 EPHX1 (0.39) CA12CA1CA2CA9MEN1
SCHEMBL3908696 0.98 EPHX1 (0.39) CA12CA1CA2CA9MEN1
SCHEMBL3909262 0.98 EPHX1 (0.39) CA12CA1CA2CA9MEN1
SCHEMBL3920594 0.98 EPHX1 (0.39) CA12CA1CA2CA9MEN1
SCHEMBL730236 0.98 EPHX1 (0.39) CA12CA1CA2CA9MEN1
SCHEMBL896888 0.94 CA12 (0.35) CA12CA1CA2CA9MEN1
SCHEMBL35515 0.94 CA12 (0.35) CA12CA1CA2CA9MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2147041-A2 METHOD OF APPLYING AN ANTI-CORROSION AND/OR ADHESION PROMOTING COATING TO A METAL AND RESULTING COATED METAL Momentive Performance Materials Inc. (US) 2010-01-27 EP claimed
WO-2008133916-A2 METHOD OF APPLYING AN ANTI-CORROSION AND/OR ADHESION PROMOTING COATING TO A METAL AND RESULTING COATED METAL MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2008-11-06 WO claimed
US-20080268162-A1 Method of applying an anti-corrosion and/or adhesion promoting coating to a metal and resulting coated metal MOMENTIVE PERFORMANCE MATERIALS INC. 2008-10-30 US claimed
US-12601970-B2 Photosensitive resin composition, method for manufacturing patterned cured product, cured product, interlayer insulating film, cover coat layer, surface protective film, and electronic component HD MICROSYSTEMS, LTD. (JP) 2026-04-14 US disclosed
US-20250362601-A1 Photosensitive Resin Composition, Method Of Manufacturing Pattern Cured Film, Cured Film, Interlayer Insulating Film, Cover Coat Layer, Surface Protective Film, And Electronic Component HD MICROSYSTEMS LTD (JP) 2025-11-27 US disclosed
EP-3255113-B1 ADHESIVE AND/OR SEALANT COMPOSITION WITH HIGH INITIAL TACK SOUDAL (BE) 2025-11-05 EP disclosed
US-12386257-B2 Photosensitive resin composition, method of manufacturing pattern cured film, cured film, interlayer insulating film, cover coat layer, surface protective film, and electronic component HD MICROSYSTEMS, LTD. (JP) 2025-08-12 US disclosed
US-12386256-B2 Photosensitive resin composition, method for producing patterned cured film, cured film, interlayer insulating film, cover coat layer, surface protective film, and electronic component HD MICROSYSTEMS, LTD. (JP) 2025-08-12 US disclosed
WO-2025095080-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED PATTERN PRODUCT, AND CURED PRODUCT 株式会社レゾナック 2025-05-08 WO disclosed
CN-113168101-B Photosensitive resin composition, method for producing pattern cured film, interlayer insulating film, coverlay, surface protective film, and electronic component 艾曲迪微系统股份有限公司 2025-02-18 CN disclosed
CN-113168102-B Photosensitive resin composition, method for producing pattern cured product, interlayer insulating film, coverlay, surface protective film, and electronic component 艾曲迪微系统股份有限公司 2024-11-19 CN disclosed
US-7151138-B2 Resin composition of poly(aryl ketone), poly(arylene sulfide) and thermosetting imide resine KUREHA CORPORATION (JP) 2006-12-19 US disclosed
EP-1416015-B1 Resin composition KUREHA CHEMICAL IND CO LTD (JP) 2006-01-18 EP disclosed
EP-1033388-B1 THERMOPLASTIC RESIN COMPOSITION KUREHA CHEMICAL IND CO LTD (JP) 2006-01-18 EP disclosed
EP-1616909-A1 RELEASE FILM FOR PRINTED WIRING BOARD PRODUCTION Asahi Kasei Chemicals Corporation (JP) 2006-01-18 EP disclosed
US-20040087733-A1 Resin composition KUREHA CORPORATION (JP) 2004-05-06 US disclosed
EP-1416015-A1 Resin composition Kureha Chemical Industry Co., Ltd. (JP) 2004-05-06 EP disclosed
US-6545075-B2 Thermoplastic resin composition KUREHA KAGAKU KOGYO K.K. (JP) 2003-04-08 US disclosed
US-20020107335-A1 Resin component containing a poly(arylene sulfide) and a polyamide-imide; and a silane compound containing a functional group selected from the group consisting of amino, ureido, epoxy, isocyanate and mercapto groups. KUREHA CORPORATION (JP) 2002-08-08 US disclosed
EP-1033388-A1 THERMOPLASTIC RESIN COMPOSITION KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) 2000-09-06 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12601970-B2 Photosensitive resin composition, method for manufacturing patterned cured product, cured product, interlayer insulating film, cover coat layer, surface protective film, and electronic component ARCN1, P4HA1, COL1A1 CA12 2828/4885CA1 2076/4885CA2 2485/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.