Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.86 |
| ▸ | GAA | P10253 | 2/20 | 0.86 |
| ▸ | TSHR | P16473 | 2/20 | 0.86 |
| ▸ | ABCC4 | O15439 | 1/20 | 0.86 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.86 |
| ▸ | HTT | P42858 | 1/20 | 0.86 |
| ▸ | CA2 | P00918 | 1/20 | 0.68 |
| ▸ | CAMK2A | Q9UQM7 | 1/20 | 0.68 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.67 |
| ▸ | RXRA | P19793 | 5/20 | 0.62 |
| ▸ | RXRB | P28702 | 5/20 | 0.62 |
| ▸ | RXRG | P48443 | 5/20 | 0.62 |
| ▸ | FFAR1 | O14842 | 3/20 | 0.60 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.56 |
| ▸ | HPGD | P15428 | 2/20 | 0.56 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.56 |
| ▸ | POLB | P06746 | 2/20 | 0.54 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.54 |
| ▸ | RGS12 | O14924 | 1/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18427891 | 1.00 | LMNA (0.86) | LMNAGAATSHRABCC4PTGS1 | |
| SCHEMBL12126599 | 0.93 | LMNA (0.75) | LMNAGAATSHRABCC4PTGS1 | |
| Felbinac SCHEMBL26084 | 0.93 | LMNA (1.00) | LMNAGAATSHRABCC4PTGS1 | |
| SCHEMBL69614 | 0.91 | CA2 (0.79) | LMNAGAATSHRABCC4PTGS1 | |
| Felbinac SCHEMBL28284674 | 0.91 | LMNA (0.95) | LMNAGAATSHRABCC4PTGS1 | |
| Felbinac SCHEMBL28284752 | 0.91 | LMNA (0.95) | LMNAGAATSHRABCC4PTGS1 | |
| SCHEMBL4940811 | 0.91 | CA2 (0.86) | LMNAGAATSHRABCC4PTGS1 | |
| Felbinac SCHEMBL28284677 | 0.91 | LMNA (0.95) | LMNAGAATSHRABCC4PTGS1 | |
| Felbinac SCHEMBL8844919 | 0.91 | LMNA (0.95) | LMNAGAATSHRABCC4PTGS1 | |
| Felbinac SCHEMBL384892 | 0.91 | LMNA (0.95) | LMNAGAATSHRABCC4PTGS1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117651750-A | Ultraviolet absorber, method for producing same, composition, molded article, and coating film | 东洋油墨SC控股株式会社 | 2024-03-05 | — | — | CN | disclosed |
| CN-114846085-B | Resin composition and molded article | 东洋油墨SC控股株式会社 | 2023-09-08 | — | — | CN | disclosed |
| CN-113454132-B | Ultraviolet-absorbing polymer, molding resin composition, and molded article | 东洋油墨SC控股株式会社 | 2023-05-09 | — | — | CN | disclosed |
| WO-2023286725-A1 | UV ABSORBER AND MANUFACTURING METHOD THEREOF, COMPOSITION, MOLDED BODY AND COATING FILM | 東洋インキＳＣホールディングス株式会社 | 2023-01-19 | — | — | WO | disclosed |
| CN-114846085-A | Resin composition and molded article | 东洋油墨SC控股株式会社 | 2022-08-02 | — | — | CN | disclosed |
| US-20210380743-A1 | ULTRAVIOLET-RAY ABSORBING POLYMER, FORMATION RESIN COMPOSITION, AND FORMED BODY | TOYO INK SC HOLDINGS CO., LTD. (JP) | 2021-12-09 | — | — | US | disclosed |
| CN-113454132-A | Ultraviolet-absorbing polymer, resin composition for molding, and molded article | 东洋油墨SC控股株式会社 | 2021-09-28 | — | — | CN | disclosed |
| WO-2021132247-A1 | RESIN COMPOSITION AND MOLDED ARTICLE | 東洋インキＳＣホールディングス株式会社 | 2021-07-01 | — | — | WO | disclosed |
| EP-2725422-B1 | PHOTOSENSITIVE COMPOSITION, MASTER PLATE FOR PLANOGRAPHIC PRINTING PLATE AND POLYURETHANE | FUJIFILM CORP (JP) | 2017-10-04 | — | — | EP | disclosed |
| US-8927195-B2 | Photosensitive composition, planographic printing plate precursor, polyurethane, and method for producing polyurethane | FUJIFILM CORPORATION (JP) | 2015-01-06 | — | — | US | disclosed |
| US-5086112-A | Modified with maleic anhydride, glycidyl acrylate and methacrylate in absence of free radical initiators; modified polyolefins in presence of radical initiator | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1992-02-04 | — | — | US | disclosed |
| EP-0440923-A1 | Polyolefin resinsompositions and process for producing same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-08-14 | — | — | EP | disclosed |
| EP-0148774-B1 | POLYPHENYLENE ETHER RESIN COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1991-05-22 | — | — | EP | disclosed |
| US-4914153-A | A MODIFIER SUCH AS MALEIC ANHYDRIDE, GLYCIDYL METHACRYLATE AND GLYCIDYL ACRYLATE, A FREE RADICAL CATALYST, A MODIFIED POLYOLEFIN WITH STYRENE, AND A BINDER SUCH AS | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1990-04-03 | — | — | US | disclosed |
| US-4879360-A | POLYESTER, EPOXIDIZED POLYBUTADIENE | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1989-11-07 | — | — | US | disclosed |
| US-4876169-A | Toner compositions with release additives therein | XEROX CORPORATION (US) | 1989-10-24 | — | — | US | disclosed |
| US-4614773-A | AROMATIC POLYESTERS EPOXY RESINS, UNSATURATED ACIDS; SOLVENT RESISTANCE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1986-09-30 | — | — | US | disclosed |
| EP-0148774-A2 | Polyphenylene ether resin composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1985-07-17 | — | — | EP | disclosed |
| US-4141911-A | REACTING DICARBOXYLIC ACID WITH MONOBASIC CHROMIC SALT, SURFACTANTS | TOKYO SHIBAURA ELECTRIC CO., LTD. (JP) | 1979-02-27 | — | — | US | disclosed |
| US-4049447-A | TONER CONTAINING LOW-MELTING, AMORPHOUS AROMATIC POLYESTER; ELECTROGRAPHY | XEROX CORPORATION (US) | 1977-09-20 | — | — | US | disclosed |