Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 7/20 | 0.66 |
| ▸ | MAPT | P10636 | 6/20 | 0.66 |
| ▸ | MEN1 | O00255 | 6/20 | 0.66 |
| ▸ | NPC1 | O15118 | 4/20 | 0.66 |
| ▸ | HPGD | P15428 | 3/20 | 0.66 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.66 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.66 |
| ▸ | TP53 | P04637 | 1/20 | 0.66 |
| ▸ | RAB9A | P51151 | 4/20 | 0.65 |
| ▸ | LIG1 | P18858 | 1/20 | 0.65 |
| ▸ | LMNA | P02545 | 3/20 | 0.58 |
| ▸ | HTT | P42858 | 2/20 | 0.58 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.58 |
| ▸ | POLB | P06746 | 1/20 | 0.58 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.58 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.58 |
| ▸ | RELA | Q04206 | 1/20 | 0.58 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.56 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.56 |
| ▸ | STS | P08842 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9827191 | 0.89 | HPGD (0.74) | KMT2AMAPTMEN1NPC1HPGD | |
| SCHEMBL29499085 | 0.84 | LIG1 (0.87) | KMT2AMAPTMEN1NPC1HPGD | |
| SCHEMBL21802003 | 0.84 | LIG1 (0.87) | KMT2AMAPTMEN1NPC1HPGD | |
| SCHEMBL8005673 | 0.82 | MAPT (0.69) | KMT2AMAPTMEN1NPC1HPGD | |
| SCHEMBL701316 | 0.82 | HPGD (0.70) | KMT2AMAPTMEN1NPC1HPGD | |
| SCHEMBL13811036 | 0.82 | HPGD (0.65) | KMT2AMAPTMEN1NPC1HPGD | |
| SCHEMBL6810412 | 0.81 | LIG1 (0.59) | KMT2AMAPTMEN1NPC1HPGD | |
| SCHEMBL22938966 | 0.81 | HPGD (0.57) | KMT2AMAPTMEN1NPC1HPGD | |
| SCHEMBL11341441 | 0.81 | HPGD (0.62) | KMT2AMAPTMEN1NPC1HPGD | |
| SCHEMBL3483879 | 0.79 | LIG1 (0.71) | KMT2AMAPTMEN1NPC1HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12339586-B2 | Photocurable resin composition containing self-crosslinkable polymer | NISSAN CHEMICAL CORPORATION (JP) | 2025-06-24 | — | — | US | disclosed |
| US-20250116936-A1 | PHOTOCURABLE RESIN COMPOSITION CONTAINING SELF-CROSSLINKABLE POLYMER | NISSAN CHEMICAL CORPORATION (JP) | 2025-04-10 | — | — | US | disclosed |
| CN-116323702-B | Method for producing single-layer phase difference material | 日产化学株式会社 | 2025-04-01 | — | — | CN | disclosed |
| EP-4485077-A1 | PHOTOCURABLE RESIN COMPOSITION CONTAINING SELF-CROSSLINKING POLYMER | Nissan Chemical Corporation (JP) | 2025-01-01 | — | — | EP | disclosed |
| CN-114616518-B | Method for manufacturing patterned single-layer phase difference material | 日产化学株式会社 | 2024-11-26 | — | — | CN | disclosed |
| CN-118871828-A | Composition for retardation film and single-layer retardation material | 日产化学株式会社 | 2024-10-29 | — | — | CN | disclosed |
| CN-118742855-A | Photocurable resin composition containing self-crosslinkable polymer | 日产化学株式会社 | 2024-10-01 | — | — | CN | disclosed |
| CN-118302462-A | Polymer composition and single layer phase difference material | 日产化学株式会社 | 2024-07-05 | — | — | CN | disclosed |
| US-20240213072-A1 | LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240199924-A1 | LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| US-6268108-B1 | MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-07-31 | — | — | US | disclosed |
| US-6087068-A | AS INTERLAYER INTERPOSED BETWEEN SURFACE OF SUBSTRATE AND A PHOTORESIST LAYER TO DECREASE ADVERSE INFLUENCES BY REFLECTION OF LIGHT ON SUBSTRATE SURFACE IN PATTERN-WISE EXPOSURE OF PHOTO-RESIST LAYER TO ULTRAVIOLET RADIATION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-07-11 | — | — | US | disclosed |
| EP-0803777-B1 | Undercoating composition for photolithographic resist | TOKYO OHKA KOGYO CO LTD (JP) | 2000-07-05 | — | — | EP | disclosed |
| US-6083665-A | Photoresist laminate and method for patterning using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-07-04 | — | — | US | disclosed |
| US-6071673-A | Method for the formation of resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-06-06 | — | — | US | disclosed |
| US-5948847-A | ACRYLATED ESTER CROSSLINKED WITH NITROGEN CONTAINING ORGANIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-09-07 | — | — | US | disclosed |
| US-5939510-A | COMPRISES AN ULTRAVIOLET BENZOPHENONE ABSORBER, NITROGEN-CONTAINING ORGANIC CROSSLINKING AGENT, AND 2,2',4,4'-TETRAHYDROXYBENZOPHENONE | TOKYO OHKA KOGYA CO., LTD. (JP) | 1999-08-17 | — | — | US | disclosed |
| US-5925495-A | Photoresist laminate and method for patterning using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-07-20 | — | — | US | disclosed |
| EP-0803777-A1 | Undercoating composition for photolithographic resist | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-10-29 | — | — | EP | disclosed |
| US-5576138-A | MIXTURE OF RESIN, PHOTOSENSITIZER AND BENZOPHENONE COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-11-19 | — | — | US | disclosed |