SCHEMBL8005673

SCHEMBL8005673

CN(C)c1ccc(C(=O)c2ccccc2N(C)C)cc1

nearest known ligand 0.69

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 7/20 0.69
ALDH1A1 P00352 5/20 0.69
SMN1; SMN2 Q16637 4/20 0.69
TP53 P04637 2/20 0.69
TSHR P16473 2/20 0.69
GAA P10253 1/20 0.69
LMNA P02545 3/20 0.67
HTT P42858 2/20 0.67
NPSR1 Q6W5P4 2/20 0.67
POLB P06746 1/20 0.67
NFKB1 P19838 1/20 0.67
NFKB2 Q00653 1/20 0.67
RELA Q04206 1/20 0.67
HPGD P15428 4/20 0.65
RAB9A P51151 3/20 0.65
NPC1 O15118 3/20 0.65
KMT2A Q03164 5/20 0.53
MEN1 O00255 4/20 0.53
CNR2 P34972 4/20 0.49
CYP2C19 P33261 2/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29414304 0.93 MAPT (0.80) MAPTALDH1A1SMN1; SMN2TP53TSHR
SCHEMBL338616 0.93 MAPT (0.80) MAPTALDH1A1SMN1; SMN2TP53TSHR
SCHEMBL9827191 0.89 HPGD (0.74) MAPTALDH1A1SMN1; SMN2TP53TSHR
SCHEMBL501813 0.87 MAPT (0.77) MAPTALDH1A1SMN1; SMN2TP53TSHR
SCHEMBL29384309 0.87 MAPT (0.77) MAPTALDH1A1SMN1; SMN2TP53TSHR
SCHEMBL30190508 0.86 MAPT (0.69) MAPTALDH1A1SMN1; SMN2TP53TSHR
Benzophenone SCHEMBL27403393 0.85 MAPT (0.74) MAPTALDH1A1SMN1; SMN2TP53TSHR
SCHEMBL21802731 0.84 RAB9A (0.68) MAPTALDH1A1SMN1; SMN2TP53TSHR
SCHEMBL27770555 0.84 MAPT (0.67) MAPTALDH1A1SMN1; SMN2TP53TSHR
SCHEMBL28351687 0.84 MAPT (0.78) MAPTALDH1A1SMN1; SMN2TP53TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6106992-A PHOTORESIST FILM COMPRISING BASE FILM, PHOTOSENSITIVE RESIN COMPOSITION LAYER COMPRISING A FLUORESCENT SUBSTANCE, A PHOTOSENSITIVE RESIN, AND A VOLATILE ORGANIC MATERIAL; USEFUL FOR PRODUCING FLUORESCENT SUBSTANCE DISPLAY DAI NIPPON PRINTING CO., LTD. (JP) 2000-08-22 US disclosed
US-5045435-A Latex of carboxylated acrylate copolymer, photoinitiator, and multilayer acrylated monomer ARMSTRONG WORLD INDUSTRIES, INC. (US) 1991-09-03 US disclosed