SCHEMBL6818429

SCHEMBL6818429

CCC(CC)(CC)C(=O)[O-].CCC(CC)(CC)C(=O)[O-].CCC(CC)(CC)C(=O)[O-].[Al+3]

nearest known ligand 0.42

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
FFAR3 O14843 2/20 0.36
HDAC3 O15379 2/20 0.36
HDAC1 Q13547 2/20 0.36
HDAC2 Q92769 2/20 0.36
HDAC8 Q9BY41 2/20 0.36
CA1 P00915 3/20 0.33
CES2 O00748 2/20 0.33
CES1 P23141 2/20 0.33
CYP3A4 P08684 2/20 0.32
TSHR P16473 2/20 0.32
NFKB1 P19838 2/20 0.32
NPSR1 Q6W5P4 2/20 0.32
CA4 P22748 1/20 0.32
ALDH1A1 P00352 1/20 0.32
CYP4F2 P78329 1/20 0.31
CYP4A11 Q02928 1/20 0.31
BBOX1 O75936 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11649902 0.97 FFAR3 (0.35) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL4777919 0.94 FFAR3 (0.41) FFAR3HDAC3HDAC1HDAC2HDAC8
Silver SCHEMBL17797184 0.94 FFAR3 (0.36) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL4957927 0.94 FFAR3 (0.36) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL15022121 0.94 FFAR3 (0.36) FFAR3HDAC3HDAC1HDAC2HDAC8
Lithium Ion SCHEMBL18321792 0.94 FFAR3 (0.36) FFAR3HDAC3HDAC1HDAC2HDAC8
Potassium Ion SCHEMBL2349658 0.94 CA4 (0.37) FFAR3HDAC3HDAC1HDAC2HDAC8
Tetramethylammonium Ion SCHEMBL2348519 0.88 BBOX1 (0.38) FFAR3HDAC3HDAC1HDAC2HDAC8
Tetrylammonium SCHEMBL2351305 0.84 TSHR (0.40) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL4920283 0.84 BBOX1 (0.40) FFAR3HDAC3HDAC1HDAC2HDAC8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-4084444-A None JP disclosed
WO-2021145064-A1 RESIN COMPOSITION, METHOD FOR PRODUCING SAME, AND MULTI-COMPONENT CURABLE RESIN COMPOSITION 株式会社カネカ 2021-07-22 WO disclosed
WO-2021125061-A1 CURABLE COMPOSITION モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 2021-06-24 WO disclosed
WO-2021125060-A1 CURABLE COMPOSITION モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 2021-06-24 WO disclosed
WO-2021125062-A1 CURABLE COMPOSITION モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 2021-06-24 WO disclosed
WO-2021125058-A1 CURABLE COMPOSITION モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 2021-06-24 WO disclosed
WO-2021125059-A1 CURABLE COMPOSITION モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 2021-06-24 WO disclosed
WO-2021049278-A1 ADDITION-CURABLE LIQUID SILICONE RUBBER COMPOSITION FOR AIRBAGS, AND AIRBAG 信越化学工業株式会社 2021-03-18 WO disclosed
WO-2020235524-A1 RESIN COMPOSITION, METHOD FOR PRODUCING SAME, AND MULTI-COMPONENT CURABLE RESIN COMPOSITION 株式会社カネカ (JP) 2020-11-26 WO disclosed
CN-111587182-A Coated with silica 株式会社太洋工作所 2020-08-25 CN disclosed
EP-1146084-B1 Curable composition KANEKA CORP (JP) 2004-09-22 EP disclosed
EP-1077763-B1 ENCAPSULATED ACTIVE MATERIALS UND PROCESS OF PREPARATION DOW CHEMICAL CO (US) 2004-02-11 EP disclosed
US-6624260-B2 Epoxy resin comprising reactive silicon group- containing polyoxyalkylene polymer with a copolymer having alkyl acrylate monomers, and curing agent; peel strength KANEKA CORPORATION (JP) 2003-09-23 US disclosed
US-20020016411-A1 Curable composition KANEKA CORPORATION (JP) 2002-02-07 US disclosed
EP-1146084-A2 Curable composition KANEKA CORPORATION (JP) 2001-10-17 EP disclosed
US-6224793-B1 POLYMER ENCAPSULATION OF PARTICLES, EXTRACTION WITH SOLVENT THE DOW CHEMICAL COMPANY 2001-05-01 US disclosed
EP-1077763-A1 ENCAPSULATED ACTIVE MATERIALS THE DOW CHEMICAL COMPANY (US) 2001-02-28 EP disclosed
WO-1999055454-A1 ENCAPSULATED ACTIVE MATERIALS THE DOW CHEMICAL COMPANY (US) 1999-11-04 WO disclosed
US-5510428-A Compositions, epoxized compositions, a heat curable resin composition, an epoxy resin composition, radically polymerized compositions, a curable resin composition and a polymer having epoxy groups DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1996-04-23 US disclosed
JP-H0484444-A CONDUCTIVE PASTE TOSHIBA CHEM CORP 1992-03-17 JP disclosed