SCHEMBL682089

SCHEMBL682089

COC(C)OCCOCc1ccc(C(C)(C)C)cc1C(C)(C)C

nearest known ligand 0.32

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.32
CYP2C19 P33261 1/20 0.32
KDM4E B2RXH2 1/20 0.32
ALDH1A1 P00352 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
SCN10A Q9Y5Y9 1/20 0.32
ATM Q13315 1/20 0.31
MEN1 O00255 1/20 0.30
HTT P42858 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14443377 0.87 CYP1A2 (0.34) CYP1A2CYP2C19KDM4EALDH1A1SMN1; SMN2
SCHEMBL682709 0.78 MAPK1 (0.43) CYP1A2CYP2C19KDM4EALDH1A1SMN1; SMN2
SCHEMBL18998953 0.72 KDM4E (0.36) KDM4EALDH1A1SMN1; SMN2ATMMEN1
SCHEMBL14118100 0.69 KDM4E (0.50) KDM4EALDH1A1SMN1; SMN2MEN1KMT2A
SCHEMBL28065002 0.69 CYP2C19 (0.35) CYP1A2CYP2C19ALDH1A1SCN10AMEN1
SCHEMBL28426226 0.68 CYP2C19 (0.40) CYP1A2CYP2C19KDM4EALDH1A1ATM
SCHEMBL10202427 0.67 ADRB2 (0.47) MEN1KMT2A
SCHEMBL2582081 0.67 CYP2C19 (0.47) CYP1A2CYP2C19ALDH1A1SMN1; SMN2MEN1
SCHEMBL10442609 0.67 CYP1A2 (0.47) CYP1A2CYP2C19ALDH1A1MEN1KMT2A
SCHEMBL27686109 0.66 MAPT (0.38) CYP1A2CYP2C19KDM4EALDH1A1ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed