SCHEMBL682709

SCHEMBL682709

COC(C)OCCOc1ccc(C(C)(C)C)cc1C(C)(C)C

nearest known ligand 0.43

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 4/20 0.43
MAPT P10636 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
KDM4E B2RXH2 10/20 0.41
ALDH1A1 P00352 5/20 0.40
SMN1; SMN2 Q16637 3/20 0.40
LMNA P02545 3/20 0.39
RECQL P46063 1/20 0.39
HTT P42858 1/20 0.39
TDP1 Q9NUW8 1/20 0.36
GAA P10253 1/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
ATM Q13315 1/20 0.35
CYP2C19 P33261 2/20 0.34
CYP1A2 P05177 1/20 0.34
CYP2D6 P10635 1/20 0.34
HSD17B10 Q99714 1/20 0.34
PTGDR2 Q9Y5Y4 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14443364 0.87 MAPK1 (0.46) MAPK1MAPTNPSR1KDM4EALDH1A1
SCHEMBL1535626 0.82 LMNA (0.51) MAPK1MAPTNPSR1KDM4EALDH1A1
SCHEMBL682188 0.78 KCNH2 (0.36) MAPK1MAPTNPSR1KDM4EALDH1A1
SCHEMBL682089 0.78 CYP1A2 (0.32) KDM4EALDH1A1SMN1; SMN2HTTMEN1
SCHEMBL1535625 0.77 MAPK1 (0.48) MAPK1MAPTNPSR1KDM4EALDH1A1
SCHEMBL15133411 0.77 MAPK1 (0.48) MAPK1MAPTNPSR1KDM4EALDH1A1
SCHEMBL14118100 0.77 KDM4E (0.50) MAPTNPSR1KDM4EALDH1A1SMN1; SMN2
SCHEMBL18998953 0.77 KDM4E (0.36) MAPK1MAPTNPSR1KDM4EALDH1A1
SCHEMBL986849 0.77 KDM4E (0.49) MAPK1MAPTNPSR1KDM4EALDH1A1
SCHEMBL15277315 0.76 MAPK1 (0.37) MAPK1MAPTNPSR1KDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed