SCHEMBL682226

SCHEMBL682226

CCC(C)c1ccc(OC(C)OCCOc2ccc(OC)c3ccccc23)cc1

nearest known ligand 0.39

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
SLC7A5 Q01650 1/20 0.39
ALDH1A1 P00352 6/20 0.36
TSHR P16473 1/20 0.36
MAPT P10636 3/20 0.36
GAA P10253 1/20 0.36
GPR84 Q9NQS5 1/20 0.36
LMNA P02545 1/20 0.36
TP53 P04637 1/20 0.36
ALOX12 P18054 1/20 0.36
KCNH2 Q12809 1/20 0.36
PTPRE P23469 1/20 0.35
NQO1 P15559 1/20 0.35
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
TDP1 Q9NUW8 1/20 0.34
NPSR1 Q6W5P4 2/20 0.34
FDPS P14324 2/20 0.33
IDO1 P14902 1/20 0.33
KDM4E B2RXH2 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2758471 0.95 ALDH1A1 (0.36) SLC7A5ALDH1A1TSHRMAPTGAA
SCHEMBL2758505 0.89 SLC7A5 (0.38) SLC7A5ALDH1A1TSHRMAPTGAA
SCHEMBL2758474 0.86 HTR1B (0.46) KMT2A
SCHEMBL2758477 0.85 GAA (0.36) SLC7A5ALDH1A1TSHRMAPTGAA
SCHEMBL2758473 0.85 MAPT (0.38) SLC7A5ALDH1A1TSHRMAPTGAA
SCHEMBL3297979 0.85 GPR84 (0.43) MAPTGPR84TP53NPSR1IDO1
SCHEMBL2758489 0.84 SLC7A5 (0.39) SLC7A5ALDH1A1TSHRMAPTGAA
SCHEMBL2758494 0.84 SLC7A5 (0.37) SLC7A5ALDH1A1TSHRGPR84TP53
SCHEMBL2758472 0.83 SLC6A2 (0.36) SLC7A5ALDH1A1TSHRMAPTGAA
SCHEMBL2758485 0.83 ALDH1A1 (0.36) SLC7A5ALDH1A1TSHRMAPTGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120003585-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-01-05 US disclosed