Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | TP53 | P04637 | 2/20 | 0.44 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | ATM | Q13315 | 1/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | HCAR2 | Q8TDS4 | 4/20 | 0.36 |
| ▸ | THRB | P10828 | 2/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6826217 | 1.00 | TSHR (0.44) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL1986279 | 0.88 | TSHR (0.50) | TSHRALDH1A1TP53HIF1AATM | |
| Methyl Alcohol SCHEMBL28310842 | 0.84 | TSHR (0.50) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL11788141 | 0.84 | TSHR (0.54) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL8648499 | 0.84 | TSHR (0.54) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL1532696 | 0.84 | TSHR (0.54) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL8898381 | 0.84 | TSHR (0.54) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL11101021 | 0.84 | TSHR (0.54) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL17187309 | 0.83 | HCAR2 (0.50) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL12468593 | 0.83 | HCAR2 (0.50) | TSHRALDH1A1TP53HIF1AHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104536264-A | Black photosensitive resin composition and application of black photosensitive resin composition | SHANGHAI FUSAITE NEW MATERIAL TECHNOLOGY CO LTD | 2015-04-22 | — | — | CN | disclosed |
| EP-1387384-A1 | Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same | Hitachi Chemical Co., Ltd. (JP) | 2004-02-04 | — | — | EP | disclosed |
| EP-0768573-B1 | Phosphor-containing photosensitive resin composition for use in manufacturing plasma display panel | HITACHI CHEMICAL CO LTD (JP) | 2003-07-30 | — | — | EP | disclosed |
| US-20030090193-A1 | Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same | NOJIRI TAKESHI (JP) | 2003-05-15 | — | — | US | disclosed |
| US-6416931-B2 | WHEREIN LOWERING OF BRIGHTNESS IS SUPPRESSED IN A PLASMA DISPLAY PANEL | HITACHI CHEMICAL CO., LTD. (JP) | 2002-07-09 | — | — | US | disclosed |
| US-20020018946-A1 | Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same | NOJIRI TAKESHI (JP) | 2002-02-14 | — | — | US | disclosed |
| US-6329111-B1 | UNIFORM THICKNESS AND SHAPE ON THE WALL SURFACE OF A BARRIER RIB AND THE BOTTOM OF THE SPACE; SUBSTRATE HAS UNEVENNESS AND PHOSPHOR LAYER FORMED ON THE INNER SURFACE OF CONCAVE PORTION; FLAT PLATE MULTICOLOR PLASMA DISPLAY PANEL | HITACHI CHEMICAL COMPANY (JP) | 2001-12-11 | — | — | US | disclosed |
| US-6248501-B1 | RESINS WITH CARBOXY GROUPS AND ETHYLENEIC UNSATURATED COMPOUNDS | HITACHI CHEMICAL CO., LTD. (JP) | 2001-06-19 | — | — | US | disclosed |
| US-6077647-A | BACK PLATE FOR PLASMA DISPLAY PANEL | HITACHI CHEMICAL CO., LTD. (JP) | 2000-06-20 | — | — | US | disclosed |
| US-5858616-A | Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same, and phosphor subjected to surface treatment and process for preparing the same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1999-01-12 | — | — | US | disclosed |
| EP-0785565-A1 | Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same | Hitachi Chemical Co., Ltd. (JP) | 1997-07-23 | — | — | EP | disclosed |
| EP-0768573-A1 | Phosphor-containing photosensitive resin composition for use in manufacturing plasma display panel | Hitachi Chemical Co., Ltd. (JP) | 1997-04-16 | — | — | EP | disclosed |