Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.50 |
| ▸ | ATM | Q13315 | 1/20 | 0.43 |
| ▸ | HCAR2 | Q8TDS4 | 6/20 | 0.41 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.33 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.33 |
| ▸ | ACHE | P22303 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | ESR1 | P03372 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6824338 | 0.88 | TSHR (0.44) | TSHRATMHCAR2MAPTALDH1A1 | |
| SCHEMBL6826217 | 0.88 | TSHR (0.44) | TSHRATMHCAR2MAPTALDH1A1 | |
| SCHEMBL16164123 | 0.84 | HCAR2 (0.47) | TSHRATMHCAR2ACHEMAPT | |
| SCHEMBL1879216 | 0.83 | HCAR2 (0.61) | TSHRATMHCAR2KEAP1NFE2L2 | |
| SCHEMBL1879214 | 0.83 | HCAR2 (0.61) | TSHRATMHCAR2KEAP1NFE2L2 | |
| SCHEMBL216328 | 0.81 | TSHR (0.64) | TSHRATMHCAR2KEAP1NFE2L2 | |
| SCHEMBL1455147 | 0.81 | TSHR (0.64) | TSHRATMHCAR2KEAP1NFE2L2 | |
| SCHEMBL608166 | 0.81 | TSHR (0.64) | TSHRATMHCAR2KEAP1NFE2L2 | |
| SCHEMBL2980459 | 0.80 | HCAR2 (0.59) | TSHRATMHCAR2KEAP1NFE2L2 | |
| SCHEMBL7262708 | 0.80 | HCAR2 (0.59) | TSHRATMHCAR2KEAP1NFE2L2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3257901-B1 | PREPARATION METHOD AND APPLICATION OF ELECTRON BEAM CURABLE PAINT AND ELECTRON BEAM CURABLE COATING | GUANGDONG TIANAN NEW MAT CO LTD (CN) | 2020-05-06 | — | — | EP | disclosed |
| US-20180002549-A1 | PREPARATION METHOD AND APPLICATION OF ELECTRON BEAM CURABLE PAINT AND ELECTRON BEAM CURABLE COATING | Guangdong Tianan New Material Co., Ltd (CN) | 2018-01-04 | — | — | US | disclosed |
| EP-3257901-A1 | PREPARATION METHOD AND APPLICATION OF ELECTRON BEAM CURABLE PAINT AND ELECTRON BEAM CURABLE COATING | Guangdong Tianan New Material Co., Ltd (CN) | 2017-12-20 | — | — | EP | disclosed |
| US-20150329425-A1 | SUPERPLASTICIZERS FOR CONCRETE AND CEMENT MATERIALS AND PROCESS FOR PRODUCING THE SAME | MAPEI S.P.A. (IT) | 2015-11-19 | — | — | US | disclosed |
| EP-2516344-B1 | SUPERPLASTICIZERS FOR CONCRETE AND CEMENT MATERIALS AND PROCESS FOR PRODUCING THE SAME | MAPEI SPA (IT) | 2014-05-14 | — | — | EP | disclosed |
| US-20130065988-A1 | SUPERPLASTICIZERS FOR CONCRETE AND CEMENT MATERIALS AND PROCESS FOR PRODUCING THE SAME | MAPEI S.P.A. (IT) | 2013-03-14 | — | — | US | disclosed |
| EP-2516344-A1 | SUPERPLASTICIZERS FOR CONCRETE AND CEMENT MATERIALS AND PROCESS FOR PRODUCING THE SAME | Mapei S.p.A. (IT) | 2012-10-31 | — | — | EP | disclosed |
| WO-2011076655-A1 | SUPERPLASTICIZERS FOR CONCRETE AND CEMENT MATERIALS AND PROCESS FOR PRODUCING THE SAME | MAPEI S.P.A. (IT) | 2011-06-30 | — | — | WO | disclosed |
| EP-2336094-A1 | \"Superplasticizers for concrete and cement materials and process for producing the same\ | Mapei S.p.A. (IT) | 2011-06-22 | — | — | EP | disclosed |
| US-20100068480-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | CITICORP NORTH AMERICA, INC., AS AGENT | 2010-03-18 | — | — | US | disclosed |
| US-20090068413-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | TAKANASHI HIROSHI | 2009-03-12 | — | — | US | disclosed |
| US-20080070160-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | TAKANASHI HIROSHI | 2008-03-20 | — | — | US | disclosed |
| US-20070111141-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | TAKANASHI HIROSHI | 2007-05-17 | — | — | US | disclosed |
| US-20070065751-A1 | Water-soluble photopolymer composition for flexographic printing and water-soluble photosensitive original printing plate for flexographic printing | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-03-22 | — | — | US | disclosed |
| EP-1764651-A2 | Water-soluble photopolymer composition for flexographic printing and water-developable photosensitive original printing plate for flexographic printing | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-03-21 | — | — | EP | disclosed |
| US-20060275702-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | TAKANASHI HIROSHI | 2006-12-07 | — | — | US | disclosed |
| US-20060147838-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | TAKANASHI HIROSHI | 2006-07-06 | — | — | US | disclosed |
| US-20060057495-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | TAKANASHI HIROSHI | 2006-03-16 | — | — | US | disclosed |
| US-20010019811-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | TAKANASHI HIROSHI (JP) | 2001-09-06 | — | — | US | disclosed |
| US-20010010893-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-08-02 | — | — | US | disclosed |