Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DGKA | P23743 | 1/20 | 0.39 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.33 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.33 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | BLM | P54132 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | FAAH | O00519 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9360984 | 0.90 | DGKA (0.43) | DGKAADRA2AADRA1ADNM1MAPT | |
| SCHEMBL10011125 | 0.90 | DGKA (0.48) | DGKAADRA2AADRA1ADNM1MAPT | |
| SCHEMBL10012061 | 0.88 | DGKA (0.52) | DGKAADRA2AADRA1ADNM1MAPT | |
| SCHEMBL10011417 | 0.88 | DGKA (0.42) | DGKAADRA2AADRA1ADNM1MAPT | |
| SCHEMBL10011607 | 0.86 | DGKA (0.45) | DGKAADRA2AADRA1ADNM1MAPT | |
| SCHEMBL10011229 | 0.85 | ADRA2A (0.44) | DGKAADRA2AADRA1ADNM1MAPT | |
| SCHEMBL10010799 | 0.84 | DGKA (0.48) | DGKAADRA2AADRA1ADNM1MAPT | |
| SCHEMBL11657712 | 0.84 | DGKA (0.39) | DGKAADRA2AADRA1ADNM1MAPT | |
| SCHEMBL10012593 | 0.84 | DGKA (0.48) | DGKAADRA2AADRA1ADNM1MAPT | |
| SCHEMBL20222244 | 0.83 | DGKA (0.40) | DGKAADRA2AADRA1ADNM1FAAH |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6743564-B2 | A POSITIVE RESIST FORMULATION CONSISTS OF NITRILE CONTAINING TERT-AMINE COMPOUND, AN ORGANIC SOLVENT AND A BASE RESIN HAVING AN ACIDIC FUNCTIONAL GROUP WHICH IS PROTECTED WITH AN ACID LABILE GROUP, A PHOTOACID GENERATOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-06-01 | — | — | US | disclosed |
| US-20020115018-A1 | Amine compounds, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-08-22 | — | — | US | disclosed |